The DOI matches its Crossref record; 1 of the 1 references it cites were found in a registry or an index.
Highly Versatile and Robust Materials for Soft Imprint Lithography Based on Thiol‐ene Click Chemistry
Open accessAbstract
As easy as “shake and bake”, the mixing and photocuring of poly-functional thiols with alkene-functional cross-linkers, via thiol-ene click chemistry, leads to materials with outstanding and tunable characteristics for soft imprint lithography. The materials are cured within 2 minutes at ambient conditions allowing stamps with high aspect ratio and sub-100 nm features to be fabricated.
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Citations
Cites
High‐Resolution Soft Lithography: Enabling Materials for Nanotechnologies
Rolland, J. P., Hagberg, E. C., Denison, G. M., Carter, K. R., & De Simone, J. M. (2004) · Angewandte Chemie International Edition · doi:10.1002/anie.200461122 · Cited by 292
Cited by
Thiol-ene “click” reactions and recent applications in polymer and materials synthesis
Lowe, A. B. (2010) · Polym. Chem. · doi:10.1039/b9py00216b · Cited by 1,563
The power of thiol‐ene chemistry
Kade, M. J., Burke, D. J., & Hawker, C. J. (2010) · Journal of Polymer Science Part A: Polymer Chemistry · doi:10.1002/pola.23824 · Cited by 853
Self-citationClick Chemistry in Materials Science
Xi, W., Scott, T. F., Kloxin, C. J., & Bowman, C. N. (2014) · Advanced Functional Materials · doi:10.1002/adfm.201302847 · Cited by 677
Toughening of photo-curable polymer networks: a review
Ligon-Auer, S. C., Schwentenwein, M., Gorsche, C., Stampfl, J., & Liska, R. (2016) · Polymer Chemistry · doi:10.1039/c5py01631b · Cited by 447
Nucleophile-Initiated Thiol-Michael Reactions: Effect of Organocatalyst, Thiol, and Ene
Chan, J. W., Hoyle, C. E., Lowe, A. B., & Bowman, M. (2010) · Macromolecules · doi:10.1021/ma101069c · Cited by 383
Metadata
- Authors
- Campos, L. M., Meinel, I., Guino, R. G., Schierhorn, M., Gupta, N., Stucky, G. D., & Hawker, C. J.
- Venue
- Advanced Materials
- Publisher
- Wiley
- Published
- 2008-09-25
- Volume
- 20
- Issue
- 19
- Pages
- 3728-3733
- ISSN
- 0935-9648 (ISSN-L)
- 1521-4095
- OpenAlex
- W2002825909
- Cited by
- 206
- References
- 1
- FWCI
- 14.28
- Type
- journal article
- Language
- en
- Open access
- bronze
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- Campos, L. M., Meinel, I., Guino, R. G., Schierhorn, M., Gupta, N., Stucky, G. D., & Hawker, C. J. (2008). Highly Versatile and Robust Materials for Soft Imprint Lithography Based on Thiol‐ene Click Chemistry. Advanced Materials. https://doi.org/10.1002/adma.200800330
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