Cited by 292Nanofabrication and Lithography TechniquesAdvanced Materials and MechanicsBlock Copolymer Self-Assembly

High‐Resolution Soft Lithography: Enabling Materials for Nanotechnologies

Rolland, Jason P., Hagberg, Erik C., Denison, Ginger M., Carter, Kenneth R., De Simone, Joseph M.·2004·Angewandte Chemie International Edition

Abstract

Making a good impression: Photocurable, liquid perfluoropolyethers (PFPEs) are ideal materials for high-resolution (<100 nm) pattern transfer and imprint lithographic processes (see pictures). PFPEs possess attributes of both elastomers and rigid materials, exhibit a remarkably low surface energy, mold extremely small features with high fidelity, resist swelling by organic solvents, and endure repetitive molding procedures.

Integrity signals

Registry

Crossref · 10.1002/anie.200461122

Cites

26 of 26 references verified0 citation errors · 0 not checkable

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  • Recent advances in synthetic techniques using high-precision fabrication show promise for the production of more precisely defined microparticles and nanoparticles.

    “Recent advances in synthetic techniques using high-precision fabrication, such as particle replication in non-wetting templates and microfluidic-based reaction chemistry, show promise for the production of more precisely defined microparticles and nanoparticles51,52.”

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Authors
Rolland, J. P., Hagberg, E. C., Denison, G. M., Carter, K. R., & De Simone, J. M.
Affiliations
  • University of North Carolina at Chapel Hill (US)
  • IBM Research - Almaden (US)
Corresponding author
Carter, Kenneth R.
Venue
Angewandte Chemie International Edition
Publisher
Wiley
Published
2004-11-02
Volume
43
Issue
43
Pages
5796-5799
ISSN
  • 1433-7851 (ISSN-L)
  • 1521-3773
OpenAlex
W2144020819
Cited by
292
References
26
Citations by year
2026: 1 · 2025: 10 · 2024: 3 · 2023: 8 · 2022: 5 · 2021: 16 · 2020: 4 · 2019: 10 · 2018: 14 · 2017: 12 · 2016: 15 · 2015: 9 · 2014: 9 · 2013: 18 · 2012: 17
FWCI
7.76
Type
journal article
Language
en
Open access
closed
Locations
  • Angewandte Chemie International Edition (publishedVersion)
  • PubMed (publishedVersion)
Topics
  • Physical Sciences › Engineering › Biomedical Engineering › Nanofabrication and Lithography Techniques
  • Physical Sciences › Engineering › Mechanical Engineering › Advanced Materials and Mechanics
  • Physical Sciences › Materials Science › Materials Chemistry › Block Copolymer Self-Assembly
Keywords
soft lithography, perfluoropolyether, imprint lithography, pattern transfer, low surface energy, solvent resistance, nanofabrication

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