The DOI matches its Crossref record; 1 of the 1 references it cites were found in a registry or an index.
The Materials Challenge in Diffraction‐Unlimited Direct‐Laser‐Writing Optical Lithography
Abstract
Using a novel photoresist (composed of pentaerythritol triacrylate and isopropyl thioxanthone) that favors stimulated emission depletion by a π-π* transition and using a two-color two-photon excitation scheme, 65-nm wide lines are achieved. This value is limited by parasitic two-photon absorption of the continuous-wave depletion beam. It is estimated that, without this process, line widths of 30 nm are in reach.
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Finer features for functional microdevices
Kawata, S., Sun, H.-B., Tanaka, T., & Takada, K. (2001) · Nature · doi:10.1038/35089130 · Cited by 2,871
Cited by
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Gu, M., Li, X., & Cao, Y. (2014) · Light: Science & Applications · doi:10.1038/lsa.2014.58 · Cited by 542
Diffraction-unlimited all-optical imaging and writing with a photochromic GFP
Grotjohann, T., Testa, I., Leutenegger, M., Bock, H., Urban, N. T., Lavoie-Cardinal, F., Willig, K. I., Eggeling, C., Jakobs, S., & Hell, S. W. (2011) · Nature · doi:10.1038/nature10497 · Cited by 501
Metadata
- Authors
- Fischer, J., von Freymann, G., & Wegener, M.
- Venue
- Advanced Materials
- Publisher
- Wiley
- Published
- 2010-06-30
- Volume
- 22
- Issue
- 32
- Pages
- 3578-3582
- ISSN
- 0935-9648 (ISSN-L)
- 1521-4095
- OpenAlex
- W2125191421
- Cited by
- 272
- References
- 1
- FWCI
- 12.38
- Type
- journal article
- Language
- en
- Open access
- closed
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- Fischer, J., von Freymann, G., & Wegener, M. (2010). The Materials Challenge in Diffraction‐Unlimited Direct‐Laser‐Writing Optical Lithography. Advanced Materials. https://doi.org/10.1002/adma.201000892
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