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Atomic Layer Deposition of Nanostructured Materials for Energy and Environmental Applications

Marichy, Catherine, Bechelany, Mikhael, Pinna, Nicola·2012·Advanced Materials

Abstract

Atomic layer deposition (ALD) is a thin film technology that in the past two decades rapidly developed from a niche technology to an established method. It proved to be a key technology for the surface modification and the fabrication of complex nanostructured materials. In this Progress Report, after a short introduction to ALD and its chemistry, the versatility of the technique for the fabrication of novel functional materials will be discussed. Selected examples, focused on its use for the engineering of nanostructures targeting applications in energy conversion and storage, and on environmental issues, will be discussed. Finally, the challenges that ALD is now facing in terms of materials fabrication and processing will be also tackled.

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Metadata

Authors
Marichy, C., Bechelany, M., & Pinna, N.
Venue
Advanced Materials
Publisher
Wiley
Published
2012-01-26
Volume
24
Issue
8
Pages
1017-1032
ISSN
  • 0935-9648 (ISSN-L)
  • 1521-4095
OpenAlex
W1994495097
Cited by
591
References
0
FWCI
33.98
Type
journal article
Language
en
Open access
closed

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CoChat. (2026). Citation check: Atomic Layer Deposition of Nanostructured Materials for Energy and Environmental Applications. https://app.cochat.ai/papers/10.1002/adma.201104129
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Marichy, C., Bechelany, M., & Pinna, N. (2012). Atomic Layer Deposition of Nanostructured Materials for Energy and Environmental Applications. Advanced Materials. https://doi.org/10.1002/adma.201104129

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Contains information from the Semantic Scholar Academic Graph Datasets, made available under the ODC Attribution License (ODC-BY 1.0).

Semantic Scholar’s data is described in: Kinney, R., et al. (2023). The Semantic Scholar Open Data Platform. arXiv:2301.10140.