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Cited by 333

The DOI matches its Crossref record; 4 of the 4 references it cites were found in a registry or an index.

Single‐Layer Semiconducting Nanosheets: High‐Yield Preparation and Device Fabrication

Zeng, Zhiyuan, Yin, Zongyou, Huang, Xiao, Li, Hai, He, Qiyuan, Lu, Gang, Boey, Freddy, Zhang, Hua·2011·Angewandte Chemie

Abstract

Ordentlich gestapelt: 2D-halbleitende Nanomaterialien aus einzelnen MoS2-, WS2-, TiS2-, TaS2-, ZrS2- und Graphenschichten wurden durch elektrochemische Lithiierung hergestellt (siehe Bild). Eine Ausbeute von 92 % wurde bei der Produktion einzelner MoS2-Schichten erreicht. Aus den MoS2-Schichten wurde ein Dünnschichttransistor hergestellt, der zum Nachweis von NO bis zu einer Detektionsgrenze von 190 ppt verwendet wurde.

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Crossref · 10.1002/ange.201106004

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Metadata

Authors
Zeng, Z., Yin, Z., Huang, X., Li, H., He, Q., Lu, G., Boey, F., & Zhang, H.
Venue
Angewandte Chemie
Publisher
Wiley
Published
2011-10-21
Volume
123
Issue
47
Pages
11289-11293
ISSN
  • 0044-8249 (ISSN-L)
  • 1521-3757
OpenAlex
W4234103693
Cited by
333
References
4
FWCI
5.73
Type
journal article
Language
de
Open access
closed

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CoChat. (2026). Citation check: Single‐Layer Semiconducting Nanosheets: High‐Yield Preparation and Device Fabrication. https://app.cochat.ai/papers/10.1002/ange.201106004
The paper
Zeng, Z., Yin, Z., Huang, X., Li, H., He, Q., Lu, G., Boey, F., & Zhang, H. (2011). Single‐Layer Semiconducting Nanosheets: High‐Yield Preparation and Device Fabrication. Angewandte Chemie. https://doi.org/10.1002/ange.201106004

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