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Fabricating three‐dimensional polymeric photonic structures by multi‐beam interference lithography

Open access
Moon, Jun Hyuk, Ford, Jamie, Yang, Shu·2006·Polymers for Advanced Technologies

Abstract

The fabrication of true three‐dimensional (3D) microstructures both rapidly and economically over a large area with negligible defects is attractive for a wide range of applications. In particular, multi‐beam interference lithography is one of the promising techniques that can mass‐produce polymeric 3D photonic crystals defect‐free over a large area. This review discusses the relationship between beam geometry and the symmetry of the interference patterns, the lithographic process, and various types of photoresist systems, including thick films of negative‐tone and positive‐tone photoresists, organic‐inorganic hybrids, hydrogels, and holographic polymer‐dispersed liquid crystals. Copyright © 2006 John Wiley & Sons, Ltd.

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Metadata

Authors
Moon, J. H., Ford, J., & Yang, S.
Venue
Polymers for Advanced Technologies
Publisher
Wiley
Published
2006-02
Volume
17
Issue
2
Pages
83-93
ISSN
  • 1042-7147 (ISSN-L)
  • 1099-1581
OpenAlex
W2018539304
Cited by
179
References
3
FWCI
7.73
Type
journal article
Language
en
Open access
green

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CoChat. (2026). Citation check: Fabricating three‐dimensional polymeric photonic structures by multi‐beam interference lithography. https://app.cochat.ai/papers/10.1002/pat.663
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Moon, J. H., Ford, J., & Yang, S. (2006). Fabricating three‐dimensional polymeric photonic structures by multi‐beam interference lithography. Polymers for Advanced Technologies. https://doi.org/10.1002/pat.663

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