The DOI matches its Crossref record; 21 of the 21 references it cites were found in a registry or an index.
Highly efficient and thermally stable Cr3+-activated silicate phosphors for broadband near-infrared LED applications
Abstract
Abstract A novel broadband near-infrared (NIR) phosphor LiInSi2O6:Cr3+ (LIS:Cr3+) is successfully synthesized via solid-state reaction. Its crystal structure, photoluminescence properties as well as the application in NIR phosphor-converted LEDs (pc-LEDs) are explored. The LIS:Cr3+ phosphor has two absorptions bands centered at ~460 and 670 nm, respectively. Under 460 nm excitation, it shows the broadband NIR emission peaking at ~840 nm with a full width at half maximum (FWHM) of ~143 nm. The optimum Cr3+ concentration is found to be ~6 mol%, whereas the intensity decrease at further increased Cr3+ content is attributed to the radiative energy transfer process. The LIS:0.06Cr3+ phosphor has a quantum yield of ~75% and can retain ~77% of the initial intensity at 150 °C. Highly efficient, thermally stable and broad NIR emissions of LIS:Cr3+ phosphors are caused by the Cr3+ preferential occupancy in [InO6] octahedron with weak crystal field but relatively strong rigidity. The NIR pc-LED is fabricated by combining the LIS:Cr3+ phosphor with the blue LED chip, which has the NIR output power of ~51.6 mW and the photoelectric efficiency of ~17.8% at 100 mA drive current. The results suggest that LIS:Cr3+ phosphors have great potential for applications in broadband NIR pc-LEDs.
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Advances in Chromium‐Activated Phosphors for Near‐Infrared Light Sources
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Broadband Near‐Infrared Garnet Phosphors with Near‐Unity Internal Quantum Efficiency
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Chromium Ion Pair Luminescence: A Strategy in Broadband Near-Infrared Light-Emitting Diode Design
Rajendran, V., Fang, M.-H., Huang, W.-T., Majewska, N., Lesniewski, T., Mahlik, S., Leniec, G., Kaczmarek, S. M., Pang, W. K., Peterson, V. K., et al. (2021) · Journal of the American Chemical Society · doi:10.1021/jacs.1c08334 · Cited by 283
Metadata
- Authors
- Xu, X., Shao, Q., Yao, L., Dong, Y., & Jiang, J.
- Venue
- Chemical Engineering Journal
- Publisher
- Elsevier BV
- Published
- 2020-03
- Volume
- 383
- Pages
- 123108
- ISSN
- 1385-8947 (ISSN-L)
- OpenAlex
- W2980208179
- Cited by
- 386
- References
- 21
- FWCI
- 14.59
- Type
- journal article
- Language
- en
- Open access
- closed
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