The DOI matches its Crossref record; 1 of the 1 references it cites were found in a registry or an index.
Block copolymers and conventional lithography
Open accessAbstract
The lithographic process is arguably the key enabling technology for the digital age. Hundreds of millions of devices can be fabricated on a single chip because patterns with features as small as 50 nm can be written with a remarkable level of perfection, in registration with the underlying substrate, and with complex geometries. As the drive to pattern at ever shrinking length scales continues, however, new imaging materials may be required to meet manufacturing constraints. We highlight some of the recent advances in integrating self-assembling block copolymers into the conventional lithographic process to address issues of resolution and process control.
Overview
The claims and statistics of this paper haven’t been checked yet.
Run the check — free, no account needed. It reads the open-access text and checks the sources it cites.
Integrity signals
Registry
Cites
Statistics
Verification
Claims the paper makes
The claims and statistics of this paper haven’t been checked yet.
Run the check — free, no account needed. It reads the open-access text and checks the sources it cites.
Self-check
Percentages, sums and reported differences re-computed from the paper’s own numbers.
The self-check needs the paper’s full text.
Citations
Cites
DeRouchey, J., Thurn-Albrecht, T., Russell, T. P., & Kolb, R. (2004) · Macromolecules · doi:10.1021/ma034739f · Cited by 54
Cited by
Thickness-independent capacitance of vertically aligned liquid-crystalline MXenes
Xia, Y., Mathis, T. S., Zhao, M.-Q., Anasori, B., Dang, A., Zhou, Z., Cho, H., Gogotsi, Y., & Yang, S. (2018) · Nature · doi:10.1038/s41586-018-0109-z · Cited by 1,310
Block copolymer based nanostructures: Materials, processes, and applications to electronics
Kim, H.-C., Park, S.-M., & Hinsberg, W. D. (2010) · Chemical Reviews · doi:10.1021/cr900159v · Cited by 1,017
Ordering in thin films of block copolymers: Fundamentals to potential applications
Hamley, I. W. (2009) · Progress in Polymer Science · doi:10.1016/j.progpolymsci.2009.06.003 · Cited by 521
Polyferrocenylsilanes: synthesis, properties, and applications
Hailes, R. L. N., Oliver, A. M., Gwyther, J., Whittell, G. R., & Manners, I. (2016) · Chemical Society Reviews · doi:10.1039/c6cs00155f · Cited by 317
Directed self-assembly of block copolymers for next generation nanolithography
Jeong, S.-J., Kim, J. Y., Kim, B. H., Moon, H.-S., & Kim, S. O. (2013) · Materials Today · doi:10.1016/j.mattod.2013.11.002 · Cited by 306
Metadata
- Authors
- Stoykovich, M. P., & Nealey, P. F.
- Venue
- Materials Today
- Publisher
- Elsevier BV
- Published
- 2006-09
- Volume
- 9
- Issue
- 9
- Pages
- 20-29
- ISSN
- 1369-7021 (ISSN-L)
- OpenAlex
- W2046875460
- Cited by
- 376
- References
- 1
- FWCI
- 9.98
- Type
- journal article
- Language
- en
- Open access
- hybrid
About these checks
Registry, retraction, Cites and statistics results are computed, not judged, with one exception: a printed reference that no index lists is read once by a model before it counts as a citation error. Claims are extracted by a model and kept only when their quote appears verbatim in the text; each cited source is then checked, with a model’s help, for whether it says what the claim relies on. Those verdicts can be wrong — read the claim’s quote and the cited source before relying on one.
Statistics and arithmetic are recomputed, not judged.
Confidence bands are shown only for fields calibrated on our annotated test set. None is calibrated yet, so no band is shown.
What counts as a claim ›How we measure confidence ›How we check this ›
Are you an author, or do you see a problem with this page? Request a review
How to cite
Cite CoChat for the checks on this page, and the paper for its own findings.
- This page
- CoChat. (2026). Citation check: Block copolymers and conventional lithography. https://app.cochat.ai/papers/10.1016/s1369-7021(06)71619-4
- The paper
- Stoykovich, M. P., & Nealey, P. F. (2006). Block copolymers and conventional lithography. Materials Today. https://doi.org/10.1016/s1369-7021(06)71619-4
Data sources
Bibliographic data: Semantic Scholar, OpenAlex, Crossref.
Contains information from the Semantic Scholar Academic Graph Datasets, made available under the ODC Attribution License (ODC-BY 1.0).
Semantic Scholar’s data is described in: Kinney, R., et al. (2023). The Semantic Scholar Open Data Platform. arXiv:2301.10140.
