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Recent Advances in Electron Tomography: TEM and HAADF-STEM Tomography for Materials Science and Semiconductor Applications
Open accessAbstract
Electron tomography is a well-established technique for three-dimensional structure determination of (almost) amorphous specimens in life sciences applications. With the recent advances in nanotechnology and the semiconductor industry, there is also an increasing need for high-resolution three-dimensional (3D) structural information in physical sciences. In this article, we evaluate the capabilities and limitations of transmission electron microscopy (TEM) and high-angle-annular-dark-field scanning transmission electron microscopy (HAADF-STEM) tomography for the 3D structural characterization of partially crystalline to highly crystalline materials. Our analysis of catalysts, a hydrogen storage material, and different semiconductor devices shows that features with a diameter as small as 1–2 nm can be resolved in three dimensions by electron tomography. For partially crystalline materials with small single crystalline domains, bright-field TEM tomography provides reliable 3D structural information. HAADF-STEM tomography is more versatile and can also be used for high-resolution 3D imaging of highly crystalline materials such as semiconductor devices.
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Cited by
3D imaging of nanomaterials by discrete tomography
Batenburg, K. J., Bals, S., Sijbers, J., Kübel, C., Midgley, P. A., Hernandez, J. C., Kaiser, U., Encina, E. R., Coronado, E. A., & Van Tendeloo, G. (2009) · Ultramicroscopy · doi:10.1016/j.ultramic.2009.01.009 · Cited by 277
Self-citationElectron Tomography for Heterogeneous Catalysts and Related Nanostructured Materials
Friedrich, H., de Jongh, P. E., Verkleij, A. J., & de Jong, K. P. (2009) · Chemical Reviews · doi:10.1021/cr800434t · Cited by 256
Metadata
- Authors
- Kübel, C., Voigt, A., Schoenmakers, R., Otten, M., Su, D., Lee, T.-C., Carlsson, A., & Bradley, J.
- Venue
- Microscopy and Microanalysis
- Publisher
- Oxford University Press (OUP)
- Published
- 2005-09-26
- Volume
- 11
- Issue
- 5
- Pages
- 378-400
- ISSN
- 1431-9276 (ISSN-L)
- 1435-8115
- OpenAlex
- W2028347506
- Cited by
- 255
- References
- 0
- FWCI
- 11.12
- Type
- journal article
- Language
- en
- Open access
- green
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- Kübel, C., Voigt, A., Schoenmakers, R., Otten, M., Su, D., Lee, T.-C., Carlsson, A., & Bradley, J. (2005). Recent Advances in Electron Tomography: TEM and HAADF-STEM Tomography for Materials Science and Semiconductor Applications. Microscopy and Microanalysis. https://doi.org/10.1017/s1431927605050361
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