Cited by 1722D Materials and ApplicationsTransition Metal Oxide NanomaterialsGraphene research and applications

Universal In Situ Substitutional Doping of Transition Metal Dichalcogenides by Liquid-Phase Precursor-Assisted Synthesis

Zhang, Tianyi, Fujisawa, Kazunori, Zhang, Fu, Liu, Mingzu, Lucking, Michael C., Gontijo, Rafael Nunes, Lei, Yu, Liu, He +5 more·2020·ACS Nano

Abstract

Doping lies at the heart of modern semiconductor technologies. Therefore, for two-dimensional (2D) semiconducting transition metal dichalcogenides (TMDs), the significance of controlled doping is no exception. Recent studies have indicated that, by substitutionally doping 2D TMDs with a judicious selection of dopants, their electrical, optical, magnetic, and catalytic properties can be effectively tuned, endowing them with great potential for various practical applications. Herein, and inspired by the sol-gel process, we report a liquid-phase precursor-assisted approach for in situ substitutional doping of monolayered TMDs and their in-plane heterostructures with tunable doping concentration. This highly reproducible route is based on the high-temperature chalcogenation of spin-coated aqueous solutions containing host and dopant precursors. The precursors are mixed homogeneously at the atomic level in the liquid phase prior to the synthesis process, thus allowing for an improved doping uniformity and controllability. We further demonstrate the incorporation of various transition metal atoms, such as iron (Fe), rhenium (Re), and vanadium (V), into the lattice of TMD monolayers to form Fe-doped WS 2 , Re-doped MoS 2 , and more complex material systems such as V-doped in-plane W x Mo 1- x S 2 -Mo x W 1- x S 2 heterostructures, among others. We envisage that our developed approach is universal and could be extended to incorporate a variety of other elements into 2D TMDs and creat…

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Crossref · 10.1021/acsnano.9b09857

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  • Columnar grain growth in CSD films is usually caused by heterogeneous nucleation at the film-substrate interface.

    “Columnar grain growth in CSD films is usually caused by heterogeneous nucleation at the film–substrate interface [34,35,36,37,38,39,40,41,42,43,44,45].”

    From Control of Columnar Grain Microstructure in CSD LaNiO3 Films (2023) · cites this paper as [35]

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Authors
Zhang, T., Fujisawa, K., Zhang, F., Liu, M., Lucking, M. C., Gontijo, R. N., Lei, Y., Liu, H., Crust, K., Granzier-Nakajima, T., Terrones, H., Elías, A. L., & Terrones, M.
Affiliations
  • Pennsylvania State University (US)
  • Rensselaer Polytechnic Institute (US)
  • The Pennsylvania State University , , , ,
Corresponding author
Terrones, Mauricio
Venue
ACS Nano
Published
2020-03-25
Volume
14
Issue
4
Pages
4326-4335
ISSN
  • 1936-0851 (ISSN-L)
  • 1936-086X
OpenAlex
W3013366469
Cited by
172
References
0
Citations by year
2026: 17 · 2025: 28 · 2024: 35 · 2023: 33 · 2022: 25 · 2021: 24 · 2020: 10
FWCI
8.95
Type
journal article
Language
en
Open access
closed
Locations
  • ACS Nano (publishedVersion)
  • PubMed (publishedVersion)
Funders
  • Division of Emerging Frontiers in Research and Innovation (EFRI-1433311)
  • Air Force Office of Scientific Research (FA9550-18-1-0072)
Topics
  • Physical Sciences › Materials Science › Materials Chemistry › 2D Materials and Applications
  • Physical Sciences › Materials Science › Polymers and Plastics › Transition Metal Oxide Nanomaterials
  • Physical Sciences › Materials Science › Materials Chemistry › Graphene research and applications
Keywords
transition metal dichalcogenides, substitutional doping, in situ doping, two-dimensional semiconductors, vanadium doping, chalcogenation, doping uniformity, spintronics

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