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Lithographic Imaging Techniques for the Formation of Nanoscopic Features
Abstract
ADVERTISEMENT RETURN TO ISSUEPREVArticleNEXTLithographic Imaging Techniques for the Formation of Nanoscopic FeaturesG. M. Wallraff and W. D. HinsbergView Author Information IBM Almaden Research Center, 650 Harry Road, San Jose, California 95120-6099 Cite this: Chem. Rev. 1999, 99, 7, 1801–1822Publication Date (Web):June 25, 1999Publication History Received20 October 1998Revised21 April 1999Published online25 June 1999Published inissue 1 July 1999https://pubs.acs.org/doi/10.1021/cr980003ihttps://doi.org/10.1021/cr980003iresearch-articleACS PublicationsCopyright © 1999 American Chemical SocietyRequest reuse permissionsArticle Views3179Altmetric-Citations440LEARN ABOUT THESE METRICSArticle Views are the COUNTER-compliant sum of full text article downloads since November 2008 (both PDF and HTML) across all institutions and individuals. These metrics are regularly updated to reflect usage leading up to the last few days.Citations are the number of other articles citing this article, calculated by Crossref and updated daily. Find more information about Crossref citation counts.The Altmetric Attention Score is a quantitative measure of the attention that a research article has received online. Clicking on the donut icon will load a page at altmetric.com with additional details about the score and the social media presence for the given article. Find more information on the Altmetric Attention Score and how the score is calculated. Share Add toView InAdd Full Text with ReferenceAdd Description ExportRISCitationCitation and abstractCitation and referencesMore Options Share onFacebookTwitterWechatLinked InRedditEmail Other access optionsGet e-Alertsclose SUBJECTS:Diffusion,Light,Lithography,Polymers,Quantum mechanics Get e-Alerts
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Citations
Cites
Dry Etch Resistance of Organic Materials
Gokan, H., Esho, S., & Ohnishi, Y. (1983) · Journal of The Electrochemical Society · doi:10.1149/1.2119642 · Cited by 265
Cited by
Chemistry and Properties of Nanocrystals of Different Shapes
Burda, C., Chen, X., Narayanan, R., & El-Sayed, M. A. (2005) · Chemical Reviews · doi:10.1021/cr030063a · Cited by 7,230
Organic materials for electronic and optoelectronic devices
Shirota, Y. (2000) · Journal of Materials Chemistry · doi:10.1039/a908130e · Cited by 1,646
Block copolymer based nanostructures: Materials, processes, and applications to electronics
Kim, H.-C., Park, S.-M., & Hinsberg, W. D. (2010) · Chemical Reviews · doi:10.1021/cr900159v · Cited by 1,017
Self-citationZhang, J., Li, Y., Zhang, X., & Yang, B. (2010) · Advanced Materials · doi:10.1002/adma.201000755 · Cited by 649
Haynes, C. L., McFarland, A. D., Smith, M. T., Hulteen, J. C., & Van Duyne, R. P. (2002) · The Journal of Physical Chemistry B · doi:10.1021/jp013570+ · Cited by 276
Metadata
- Authors
- Wallraff, G. M., & Hinsberg, W. D.
- Venue
- Chemical Reviews
- Publisher
- American Chemical Society (ACS)
- Published
- 1999-06-25
- Volume
- 99
- Issue
- 7
- Pages
- 1801-1822
- ISSN
- 0009-2665 (ISSN-L)
- 1520-6890
- OpenAlex
- W1967362514
- Cited by
- 501
- References
- 1
- FWCI
- 6.65
- Type
- journal article
- Language
- en
- Open access
- closed
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