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Cited by 341

The DOI matches its Crossref record; 20 of the 20 references it cites were found in a registry or an index.

Irradiation-Induced Heck Reaction of Unactivated Alkyl Halides at Room Temperature

Wang, Guang-Zu, Shang, Rui, Cheng, Wan-Min, Fu, Yao·2017·Journal of the American Chemical Society

Abstract

The palladium-catalyzed Mizoroki-Heck reaction is arguably one of the most significant carbon-carbon bond-construction reactions to be discovered in the last 50 years, with a tremendous number of applications in the production of chemicals. This Nobel-Prize-winning transformation has yet to overcome the obstacle of its general application in a range of alkyl electrophiles, especially tertiary alkyl halides that possess eliminable β-hydrogen atoms. Whereas most palladium-catalyzed cross-coupling reactions utilize the ground-state reactivity of palladium complexes under thermal conditions and generally apply a single ligand system, we report that the palladium-catalyzed Heck reaction proceeds smoothly at room temperature with a variety of tertiary, secondary, and primary alkyl bromides upon irradiation with blue light-emitting diodes in the presence of a dual phosphine ligand system. We rationalize that this unprecedented transformation is achieved by utilizing the photoexcited-state reactivity of the palladium complex to enhance oxidative addition and suppress undesired β-hydride elimination.

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Metadata

Authors
Wang, G.-Z., Shang, R., Cheng, W.-M., & Fu, Y.
Venue
Journal of the American Chemical Society
Published
2017-11-20
Volume
139
Issue
50
Pages
18307-18312
ISSN
  • 0002-7863 (ISSN-L)
  • 1520-5126
OpenAlex
W2767672561
Cited by
341
References
20
FWCI
13.82
Type
journal article
Language
en
Open access
closed

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CoChat. (2026). Citation check: Irradiation-Induced Heck Reaction of Unactivated Alkyl Halides at Room Temperature. https://app.cochat.ai/papers/10.1021/jacs.7b10009
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Wang, G.-Z., Shang, R., Cheng, W.-M., & Fu, Y. (2017). Irradiation-Induced Heck Reaction of Unactivated Alkyl Halides at Room Temperature. Journal of the American Chemical Society. https://doi.org/10.1021/jacs.7b10009

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