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The Effect of Calcination Temperature on the Surface Microstructure and Photocatalytic Activity of TiO2 Thin Films Prepared by Liquid Phase Deposition

Yu, Jia-Guo, Yu, Huo-Gen, Cheng, Bei, Zhao, Xiu-Jian, Yu, Jimmy C., Ho, Wing-Kei·2003·The Journal of Physical Chemistry B

Abstract

TiO 2 thin films were prepared on fused quartz by the liquid-phase deposition (LPD) method from a (NH 4 ) 2 TiF 6 aqueous solution upon addition of boric acid (H 3 BO 3 ) and calcined at various temperatures. The as-prepared films were characterized with thermogravimetry (TG), Fourier transform infrared spectra (FTIR), X-ray diffraction (XRD), UV−Visible spectrophotometry (UV−Vis), scanning electron microscopy (SEM), photoluminescence spectra (PL), and X-ray photoelectron spectroscopy (XPS), respectively. The photocatalytic activity of the samples was evaluated by photocatalytic decolorization of methyl orange aqueous solution. It was found that the as-prepared TiO 2 thin films contained not only Ti and O elements, but also a small amount of F, N, and Si elements. The F and N came from the precursor solution, and the amount of F decreased with increasing calcination temperature. Two sources of Si were identified. One was from the SiF 6 2- ions, which were formed by a reaction between the treatment solution and quartz substrate. The other was attributed to the diffusion of Si from the surface of quartz substrate into TiO 2 thin film at 700 °C or higher calcination temperatures. With increasing calcination temperature, the photocatalytic activity of the TiO 2 thin films gradually increased due to the improvement of crystallization of the anatase TiO 2 thin films. At 700 °C, the TiO 2 thin film showed the highest photocatalytic activity due to the increasing amount of SiO 2 as an adsorbent center and better crystallization of TiO 2 in the composite thin film. Moreover, the SiO 2 /TiO 2 composite thin film showed the lowest PL intensity due to a decrease in the recombination rate of photogenerated electrons and holes under UV light irradiation, which further confirms the film with the highest photocatalytic activity at 700 °C. When the calcination temperature is higher than 700 °C, the decrease in photocatalytic activity is due to the formation of rutile and the sintering and growth of TiO 2 crystallites resulting in the decrease of surface area.

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Metadata

Authors
Yu, J.-G., Yu, H.-G., Cheng, B., Zhao, X.-J., Yu, J. C., & Ho, W.-K.
Venue
The Journal of Physical Chemistry B
Published
2003-11-20
Volume
107
Issue
50
Pages
13871-13879
ISSN
  • 1520-5207 (ISSN-L)
  • 1520-6106
OpenAlex
W1987744916
Cited by
1,177
References
3
FWCI
18.84
Type
journal article
Language
en
Open access
closed

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