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Surface Chemistry for Atomic Layer Growth
Abstract
Atomic layer controlled film growth is an important technological and scientific goal that is closely tied to many issues in surface chemistry. This article first reviews the basic concepts of atomic layer growth using molecular precursors and binary reaction sequence chemistry. Many examples are given for the various films that have been grown using this atomic layer growth technique. The paradigms for atomic layer epitaxy (ALE) and atomic layer processing (ALP) are then discussed in terms of self-limiting surface reactions. Recent investigations of the surface chemistry of SiO 2 and Al 2 O 3 ALP and GaAs ALE are examined and used to illustrate the possible mechanisms of atomic layer growth. Subsequently, the characteristics of film deposition using atomic layer growth techniques are explored using recent examples for Al 2 O 3 ALP. The structure of the deposited films is also reviewed using results from previous Al 2 O 3 deposition investigations. This article then concludes by discussing possible complications to studies of atomic layer controlled growth using binary reaction sequence chemistry.
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Citations
Cited by
Surface Chemistry for Molecular Layer Deposition of Organic and Hybrid Organic−Inorganic Polymers
George, S. M., Yoon, B., & Dameron, A. A. (2009) · Accounts of Chemical Research · doi:10.1021/ar800105q · Cited by 377
Self-citationJung, Y. S., Cavanagh, A. S., Dillon, A. C., Groner, M. D., George, S. M., & Lee, S.-H. (2010) · Journal of The Electrochemical Society · doi:10.1149/1.3258274 · Cited by 361
Self-citationMolecular Layer Deposition of Alucone Polymer Films Using Trimethylaluminum and Ethylene Glycol
Dameron, A. A., Seghete, D., Burton, B. B., Davidson, S. D., Cavanagh, A. S., Bertrand, J. A., & George, S. M. (2008) · Chemistry of Materials · doi:10.1021/cm7032977 · Cited by 342
Self-citationGoldstein, D. N., McCormick, J. A., & George, S. M. (2008) · The Journal of Physical Chemistry C · doi:10.1021/jp804296a · Cited by 330
Self-citationRecent progress on thin-film encapsulation technologies for organic electronic devices
Yu, D., Yang, Y.-Q., Chen, Z., Tao, Y., & Liu, Y.-F. (2016) · Optics Communications · doi:10.1016/j.optcom.2015.08.021 · Cited by 274
Metadata
- Authors
- George, S. M., Ott, A. W., & Klaus, J. W.
- Venue
- The Journal of Physical Chemistry
- Publisher
- American Chemical Society (ACS)
- Published
- 1996-01-01
- Volume
- 100
- Issue
- 31
- Pages
- 13121-13131
- ISSN
- 0022-3654 (ISSN-L)
- 1541-5740
- OpenAlex
- W1993243846
- Cited by
- 680
- References
- 0
- FWCI
- 11.16
- Type
- journal article
- Language
- en
- Open access
- closed
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- George, S. M., Ott, A. W., & Klaus, J. W. (1996). Surface Chemistry for Atomic Layer Growth. The Journal of Physical Chemistry. https://doi.org/10.1021/jp9536763
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