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Low-Frequency Electronic Noise in Single-Layer MoS2 Transistors

Open access
Sangwan, Vinod K., Arnold, Heather N., Jariwala, Deep, Marks, Tobin J., Lauhon, Lincoln J., Hersam, Mark C.·2013·Nano Letters

Abstract

Ubiquitous low-frequency 1/f noise can be a limiting factor in the performance and application of nanoscale devices. Here, we quantitatively investigate low-frequency electronic noise in single-layer transition metal dichalcogenide MoS2 field-effect transistors. The measured 1/f noise can be explained by an empirical formulation of mobility fluctuations with the Hooge parameter ranging between 0.005 and 2.0 in vacuum (<10(-5) Torr). The field-effect mobility decreased, and the noise amplitude increased by an order of magnitude in ambient conditions, revealing the significant influence of atmospheric adsorbates on charge transport. In addition, single Lorentzian generation-recombination noise was observed to increase by an order of magnitude as the devices were cooled from 300 to 6.5 K.

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Metadata

Authors
Sangwan, V. K., Arnold, H. N., Jariwala, D., Marks, T. J., Lauhon, L. J., & Hersam, M. C.
Venue
Nano Letters
Published
2013-08-19
Volume
13
Issue
9
Pages
4351-4355
ISSN
  • 1530-6984 (ISSN-L)
  • 1530-6992
OpenAlex
W2003460823
Cited by
265
References
1
FWCI
12.88
Type
journal article
Language
en
Open access
green

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CoChat. (2026). Citation check: Low-Frequency Electronic Noise in Single-Layer MoS2 Transistors. https://app.cochat.ai/papers/10.1021/nl402150r
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Sangwan, V. K., Arnold, H. N., Jariwala, D., Marks, T. J., Lauhon, L. J., & Hersam, M. C. (2013). Low-Frequency Electronic Noise in Single-Layer MoS2 Transistors. Nano Letters. https://doi.org/10.1021/nl402150r

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