The DOI matches its Crossref record; 25 of the 25 references it cites were found in a registry or an index.
Extended Arrays of Vertically Aligned Sub-10 nm Diameter [100] Si Nanowires by Metal-Assisted Chemical Etching
Abstract
Large-area high density silicon nanowire (SiNW) arrays were fabricated by metal-assisted chemical etching of silicon, utilizing anodic aluminum oxide (AAO) as a patterning mask of a thin metallic film on a Si (100) substrate. Both the diameter of the pores in the AAO mask and the thickness of the metal film affected the diameter of SiNWs. The diameter of the SiNWs decreased with an increase of thickness of the metal film. Large-area SiNWs with average diameters of 20 nm down to 8 nm and wire densities as high as 10 (10) wires/cm (2) were accomplished. These SiNWs were single crystalline and vertically aligned to the (100) substrate. It was revealed by transmission electron microscopy that the SiNWs were of high crystalline quality and showed a smooth surface.
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Cites
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Self-citationNanowire Nanosensors for Highly Sensitive and Selective Detection of Biological and Chemical Species
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Self-citationMetal-assisted chemical etching in HF/H2O2 produces porous silicon
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Aligned Single‐Crystalline Si Nanowire Arrays for Photovoltaic Applications
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Cited by
Metal‐Assisted Chemical Etching of Silicon: A Review: In memory of Prof. Ulrich Gösele
Huang, Z., Geyer, N., Werner, P., de Boor, J., & Gösele, U. (2011) · Advanced Materials · doi:10.1002/adma.201001784 · Cited by 1,909
Self-citationSilicon Nanowire-Based Solar Cells on Glass: Synthesis, Optical Properties, and Cell Parameters
Sivakov, V., Andrä, G., Gawlik, A., Berger, A., Plentz, J., Falk, F., & Christiansen, S. H. (2009) · Nano Letters · doi:10.1021/nl803641f · Cited by 489
Metadata
- Authors
- Huang, Z., Zhang, X., Reiche, M., Liu, L., Lee, W., Shimizu, T., Senz, S., & Gösele, U.
- Venue
- Nano Letters
- Publisher
- American Chemical Society (ACS)
- Published
- 2008-08-13
- Volume
- 8
- Issue
- 9
- Pages
- 3046-3051
- ISSN
- 1530-6984 (ISSN-L)
- 1530-6992
- OpenAlex
- W2099454047
- Cited by
- 329
- References
- 25
- FWCI
- 14.50
- Type
- journal article
- Language
- en
- Open access
- closed
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- Huang, Z., Zhang, X., Reiche, M., Liu, L., Lee, W., Shimizu, T., Senz, S., & Gösele, U. (2008). Extended Arrays of Vertically Aligned Sub-10 nm Diameter [100] Si Nanowires by Metal-Assisted Chemical Etching. Nano Letters. https://doi.org/10.1021/nl802324y
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