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Nature of Electronic States in Atomically Thin MoS2 Field-Effect Transistors

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Ghatak, Subhamoy, Pal, Atindra Nath, Ghosh, Arindam·2011·ACS Nano

Abstract

We present low-temperature electrical transport experiments in five field-effect transistor devices consisting of monolayer, bilayer, and trilayer MoS(2) films, mechanically exfoliated onto Si/SiO(2) substrate. Our experiments reveal that the electronic states in all films are localized well up to room temperature over the experimentally accessible range of gate voltage. This manifests in two-dimensional (2D) variable range hopping (VRH) at high temperatures, while below ∼30 K, the conductivity displays oscillatory structures in gate voltage arising from resonant tunneling at the localized sites. From the correlation energy (T(0)) of VRH and gate voltage dependence of conductivity, we suggest that Coulomb potential from trapped charges in the substrate is the dominant source of disorder in MoS(2) field-effect devices, which leads to carrier localization, as well.

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Metadata

Authors
Ghatak, S., Pal, A. N., & Ghosh, A.
Venue
ACS Nano
Published
2011-09-19
Volume
5
Issue
10
Pages
7707-7712
ISSN
  • 1936-0851 (ISSN-L)
  • 1936-086X
OpenAlex
W2102122128
Cited by
865
References
2
FWCI
24.01
Type
journal article
Language
en
Open access
green

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CoChat. (2026). Citation check: Nature of Electronic States in Atomically Thin MoS2 Field-Effect Transistors. https://app.cochat.ai/papers/10.1021/nn202852j
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Ghatak, S., Pal, A. N., & Ghosh, A. (2011). Nature of Electronic States in Atomically Thin MoS2 Field-Effect Transistors. ACS Nano. https://doi.org/10.1021/nn202852j

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Contains information from the Semantic Scholar Academic Graph Datasets, made available under the ODC Attribution License (ODC-BY 1.0).

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