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Cited by 253

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Atomic Layer Deposition of a Submonolayer Catalyst for the Enhanced Photoelectrochemical Performance of Water Oxidation with Hematite

Riha, Shannon C., Klahr, Benjamin M., Tyo, Eric C., Seifert, Sönke, Vajda, Stefan, Pellin, Michael J., Hamann, Thomas W., Martinson, Alex B. F.·2013·ACS Nano

Abstract

Hematite photoanodes were coated with an ultrathin cobalt oxide layer by atomic layer deposition (ALD). The optimal coating-1 ALD cycle, which amounts to <1 monolayer of Co(OH)2/Co3O4-resulted in significantly enhanced photoelectrochemical water oxidation performance. A stable, 100-200 mV cathodic shift in the photocurrent onset potential was observed that is correlated to an order of magnitude reduction in the resistance to charge transfer at the Fe2O3/H2O interface. Furthermore, the optical transparency of the ultrathin Co(OH)2/Co3O4 coating establishes it as a particularly advantageous treatment for nanostructured water oxidation photoanodes. The photocurrent of catalyst-coated nanostructured inverse opal scaffold hematite photoanodes reached 0.81 and 2.1 mA/cm(2) at 1.23 and 1.53 V, respectively.

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Metadata

Authors
Riha, S. C., Klahr, B. M., Tyo, E. C., Seifert, S., Vajda, S., Pellin, M. J., Hamann, T. W., & Martinson, A. B. F.
Venue
ACS Nano
Published
2013-02-28
Volume
7
Issue
3
Pages
2396-2405
ISSN
  • 1936-0851 (ISSN-L)
  • 1936-086X
OpenAlex
W2327406826
Cited by
253
References
0
FWCI
14.67
Type
journal article
Language
en
Open access
closed

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CoChat. (2026). Citation check: Atomic Layer Deposition of a Submonolayer Catalyst for the Enhanced Photoelectrochemical Performance of Water Oxidation with Hematite. https://app.cochat.ai/papers/10.1021/nn305639z
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Riha, S. C., Klahr, B. M., Tyo, E. C., Seifert, S., Vajda, S., Pellin, M. J., Hamann, T. W., & Martinson, A. B. F. (2013). Atomic Layer Deposition of a Submonolayer Catalyst for the Enhanced Photoelectrochemical Performance of Water Oxidation with Hematite. ACS Nano. https://doi.org/10.1021/nn305639z

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