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Hole Contacts on Transition Metal Dichalcogenides: Interface Chemistry and Band Alignments

McDonnell, Stephen, Azcatl, Angelica, Addou, Rafik, Gong, Cheng, Battaglia, Corsin, Chuang, Steven, Cho, Kyeongjae, Javey, Ali, Wallace, Robert M.·2014·ACS Nano

Abstract

MoOx shows promising potential as an efficient hole injection layer for p-FETs based on transition metal dichalcogenides. A combination of experiment and theory is used to study the surface and interfacial chemistry, as well as the band alignments for MoOx/MoS2 and MoOx/WSe2 heterostructures, using photoelectron spectroscopy, scanning tunneling microscopy, and density functional theory. A Mo(5+) rich interface region is identified and is proposed to explain the similar low hole Schottky barriers reported in a recent device study utilizing MoOx contacts on MoS2 and WSe2.

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Metadata

Authors
McDonnell, S., Azcatl, A., Addou, R., Gong, C., Battaglia, C., Chuang, S., Cho, K., Javey, A., & Wallace, R. M.
Venue
ACS Nano
Published
2014-05-09
Volume
8
Issue
6
Pages
6265-6272
ISSN
  • 1936-0851 (ISSN-L)
  • 1936-086X
OpenAlex
W2324839689
Cited by
197
References
0
FWCI
10.87
Type
journal article
Language
en
Open access
closed

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CoChat. (2026). Citation check: Hole Contacts on Transition Metal Dichalcogenides: Interface Chemistry and Band Alignments. https://app.cochat.ai/papers/10.1021/nn501728w
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McDonnell, S., Azcatl, A., Addou, R., Gong, C., Battaglia, C., Chuang, S., Cho, K., Javey, A., & Wallace, R. M. (2014). Hole Contacts on Transition Metal Dichalcogenides: Interface Chemistry and Band Alignments. ACS Nano. https://doi.org/10.1021/nn501728w

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