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Cited by 258

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Self-Limiting Layer-by-Layer Oxidation of Atomically Thin WSe2

Yamamoto, Mahito, Dutta, Sudipta, Aikawa, Shinya, Nakaharai, Shu, Wakabayashi, Katsunori, Fuhrer, Michael S., Ueno, Keiji, Tsukagoshi, Kazuhito·2015·Nano Letters

Abstract

Growth of a uniform oxide film with a tunable thickness on two-dimensional transition metal dichalcogenides is of great importance for electronic and optoelectronic applications. Here we demonstrate homogeneous surface oxidation of atomically thin WSe2 with a self-limiting thickness from single- to trilayers. Exposure to ozone (O3) below 100 °C leads to the lateral growth of tungsten oxide selectively along selenium zigzag-edge orientations on WSe2. With further O3 exposure, the oxide regions coalesce and oxidation terminates leaving a uniform thickness oxide film on top of unoxidized WSe2. At higher temperatures, oxidation evolves in the layer-by-layer regime up to trilayers. The oxide films formed on WSe2 are nearly atomically flat. Using photoluminescence and Raman spectroscopy, we find that the underlying single-layer WSe2 is decoupled from the top oxide but hole-doped. Our findings offer a new strategy for creating atomically thin heterostructures of semiconductors and insulating oxides with potential for applications in electronic devices.

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Metadata

Authors
Yamamoto, M., Dutta, S., Aikawa, S., Nakaharai, S., Wakabayashi, K., Fuhrer, M. S., Ueno, K., & Tsukagoshi, K.
Venue
Nano Letters
Published
2015-02-06
Volume
15
Issue
3
Pages
2067-2073
ISSN
  • 1530-6984 (ISSN-L)
  • 1530-6992
OpenAlex
W2320406738
Cited by
258
References
48
FWCI
9.59
Type
journal article
Language
en
Open access
closed

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CoChat. (2026). Citation check: Self-Limiting Layer-by-Layer Oxidation of Atomically Thin WSe2. https://app.cochat.ai/papers/10.1021/nl5049753
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Yamamoto, M., Dutta, S., Aikawa, S., Nakaharai, S., Wakabayashi, K., Fuhrer, M. S., Ueno, K., & Tsukagoshi, K. (2015). Self-Limiting Layer-by-Layer Oxidation of Atomically Thin WSe2. Nano Letters. https://doi.org/10.1021/nl5049753

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