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Ultra-Low Shrinkage Hybrid Photosensitive Material for Two-Photon Polymerization Microfabrication
Abstract
Investigations into the structuring by two-photon polymerization of a nonshrinking, photosensitive, zirconium sol-gel material are presented. This hybrid material can be photostructured even when it contains up to 30 mol % of zirconium propoxide (ZPO); by varying the material's inorganic content, it is possible to modify and tune its refractive index. The introduction of ZPO significantly increases the photosensitivity of the resulting photopolymer. The fabricated three-dimensional photonic crystal structures demonstrate high resolution and a clear band-stop in the near-IR region. In contrast to common practice, no additional effort is required to precompensate for shrinkage or to improve the structural stability of the fabricated photonic crystals; this, combined with the possibility of tuning this material's optical, mechanical, and chemical properties, makes it suitable for a variety of applications by two-photon polymerization manufacturing.
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Cited by
Ultrafast laser nanostructuring of photopolymers: a decade of advances
Malinauskas, M., Farsari, M., Piskarskas, A., & Juodkazis, S. (2013) · Physics Reports · doi:10.1016/j.physrep.2013.07.005 · Cited by 431
Self-citationThree-Dimensional Biodegradable Structures Fabricated by Two-Photon Polymerization
Claeyssens, F., Hasan, E. A., Gaidukeviciute, A., Achilleos, D. S., Ranella, A., Reinhardt, C., Ovsianikov, A., Shizhou, X., Fotakis, C., Vamvakaki, M., et al. (2009) · Langmuir · doi:10.1021/la803803m · Cited by 187
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Metadata
- Authors
- Ovsianikov, A., Viertl, J., Chichkov, B., Oubaha, M., MacCraith, B., Sakellari, I., Giakoumaki, A., Gray, D., Vamvakaki, M., Farsari, M., & Fotakis, C.
- Venue
- ACS Nano
- Publisher
- American Chemical Society (ACS)
- Published
- 2008-11-01
- Volume
- 2
- Issue
- 11
- Pages
- 2257-2262
- ISSN
- 1936-0851 (ISSN-L)
- 1936-086X
- OpenAlex
- W1985677566
- Cited by
- 514
- References
- 0
- FWCI
- 10.45
- Type
- journal article
- Language
- en
- Open access
- closed
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- Ovsianikov, A., Viertl, J., Chichkov, B., Oubaha, M., MacCraith, B., Sakellari, I., Giakoumaki, A., Gray, D., Vamvakaki, M., Farsari, M., & Fotakis, C. (2008). Ultra-Low Shrinkage Hybrid Photosensitive Material for Two-Photon Polymerization Microfabrication. ACS Nano. https://doi.org/10.1021/nn800451w
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