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Cited by 248

The DOI matches its Crossref record; 1 of the 1 references it cites were found in a registry or an index.

Thin film microcalorimeter for heat capacity measurements from 1.5 to 800 K

Denlinger, D. W., Abarra, E. N., Allen, Kimberly, Rooney, P. W., Messer, M. T., Watson, S. K., Hellman, F.·1994·Review of Scientific Instruments

Abstract

A new microcalorimeter for measuring heat capacity of thin films in the range 1.5–800 K is described. Semiconductor processing techniques are used to create a device with an amorphous silicon nitride membrane as the sample substrate, a Pt thin film resistor for temperatures greater than 40 K, and either a thin film amorphous Nb–Si or a novel boron-doped polycrystalline silicon thermometer for lower temperatures. The addenda of the device, including substrate, is 4×10−6 J/K at room temperature and 2×10−9 J/K at 4.3 K, approximately two orders of magnitude less than any existing calorimeter used for measuring thin films. The device is capable of measuring the heat capacity of thin film samples as small as a few micrograms.

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Crossref · 10.1063/1.1144925

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Metadata

Authors
Denlinger, D. W., Abarra, E. N., Allen, K., Rooney, P. W., Messer, M. T., Watson, S. K., & Hellman, F.
Venue
Review of Scientific Instruments
Published
1994-04-01
Volume
65
Issue
4
Pages
946-959
ISSN
  • 0034-6748 (ISSN-L)
  • 1089-7623
OpenAlex
W1989573808
Cited by
248
References
1
FWCI
4.76
Type
journal article
Language
en
Open access
closed

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CoChat. (2026). Citation check: Thin film microcalorimeter for heat capacity measurements from 1.5 to 800 K. https://app.cochat.ai/papers/10.1063/1.1144925
The paper
Denlinger, D. W., Abarra, E. N., Allen, K., Rooney, P. W., Messer, M. T., Watson, S. K., & Hellman, F. (1994). Thin film microcalorimeter for heat capacity measurements from 1.5 to 800 K. Review of Scientific Instruments. https://doi.org/10.1063/1.1144925

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