The DOI matches its Crossref record; 1 of the 1 references it cites were found in a registry or an index.
Growth process conditions of vertically aligned carbon nanotubes using plasma enhanced chemical vapor deposition
Abstract
The growth of vertically aligned carbon nanotubes using a direct current plasma enhanced chemical vapor deposition system is reported. The growth properties are studied as a function of the Ni catalyst layer thickness, bias voltage, deposition temperature, C2H2:NH3 ratio, and pressure. It was found that the diameter, growth rate, and areal density of the nanotubes are controlled by the initial thickness of the catalyst layer. The alignment of the nanotubes depends on the electric field. Our results indicate that the growth occurs by diffusion of carbon through the Ni catalyst particle, which rides on the top of the growing tube.
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Citations
Cites
Principles of Plasma Discharges and Materials Processing
Lieberman, M. A., & Lichtenberg, A. J. (2005) · doi:10.1002/0471724254 · Cited by 4,748
Cited by
Superhydrophobic Carbon Nanotube Forests
Lau, K. K. S., Bico, J., Teo, K. B. K., Chhowalla, M., Amaratunga, G. A. J., Milne, W. I., McKinley, G. H., & Gleason, K. K. (2003) · Nano Letters · doi:10.1021/nl034704t · Cited by 1,537
Self-citationCarbon supports for low-temperature fuel cell catalysts
Antolini, E. (2009) · Applied Catalysis B: Environmental · doi:10.1016/j.apcatb.2008.09.030 · Cited by 1,295
Supercapacitors: Review of Materials and Fabrication Methods
Vangari, M., Pryor, T., & Jiang, L. (2013) · Journal of Energy Engineering · doi:10.1061/(asce)ey.1943-7897.0000102 · Cited by 608
Shah, K., Patel, S., Halder, P., Kundu, S., Marzbali, M. H., Hakeem, I. G., Pramanik, B. K., Chiang, K., & Patel, T. (2022) · Journal of Environmental Management · doi:10.1016/j.jenvman.2021.113791 · Cited by 44
Metadata
- Authors
- Chhowalla, M., Teo, K. B. K., Ducati, C., Rupesinghe, N. L., Amaratunga, G. A. J., Ferrari, A. C., Roy, D., Robertson, J., & Milne, W. I.
- Venue
- Journal of Applied Physics
- Publisher
- AIP Publishing
- Published
- 2001-11-15
- Volume
- 90
- Issue
- 10
- Pages
- 5308-5317
- ISSN
- 0021-8979 (ISSN-L)
- 1089-7550
- OpenAlex
- W2076767250
- Cited by
- 1,064
- References
- 1
- FWCI
- 45.28
- Type
- journal article
- Language
- en
- Open access
- closed
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- The paper
- Chhowalla, M., Teo, K. B. K., Ducati, C., Rupesinghe, N. L., Amaratunga, G. A. J., Ferrari, A. C., Roy, D., Robertson, J., & Milne, W. I. (2001). Growth process conditions of vertically aligned carbon nanotubes using plasma enhanced chemical vapor deposition. Journal of Applied Physics. https://doi.org/10.1063/1.1410322
Data sources
Bibliographic data: Semantic Scholar, OpenAlex, Crossref.
Contains information from the Semantic Scholar Academic Graph Datasets, made available under the ODC Attribution License (ODC-BY 1.0).
Semantic Scholar’s data is described in: Kinney, R., et al. (2023). The Semantic Scholar Open Data Platform. arXiv:2301.10140.
