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Viscous flow reactor with quartz crystal microbalance for thin film growth by atomic layer deposition
Abstract
A chemical reactor was constructed for growing thin films using atomic layer deposition (ALD) techniques. This reactor utilizes a viscous flow of inert carrier gas to transport the reactants to the sample substrates and to sweep the unused reactants and reaction products out of the reaction zone. A gas pulse switching method is employed for introducing the reactants. An in situ quartz crystal microbalance (QCM) in the reaction zone is used for monitoring the ALD film growth. By modifying a commercially available QCM housing and using polished QCM sensors, quantitative thickness measurements of the thin films grown by ALD are obtained in real time. The QCM is employed to characterize the performance of the viscous flow reactor during Al2O3 ALD.
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Citations
Cited by
Molecular Layer Deposition of Alucone Polymer Films Using Trimethylaluminum and Ethylene Glycol
Dameron, A. A., Seghete, D., Burton, B. B., Davidson, S. D., Cavanagh, A. S., Bertrand, J. A., & George, S. M. (2008) · Chemistry of Materials · doi:10.1021/cm7032977 · Cited by 342
Self-citationGoldstein, D. N., McCormick, J. A., & George, S. M. (2008) · The Journal of Physical Chemistry C · doi:10.1021/jp804296a · Cited by 330
Self-citationLu, J., Low, K.-B., Lei, Y., Libera, J. A., Nicholls, A., Stair, P. C., & Elam, J. W. (2014) · Nature Communications · doi:10.1038/ncomms4264 · Cited by 233
Self-citationOnn, T., Küngas, R., Fornasiero, P., Huang, K., & Gorte, R. (2018) · Inorganics · doi:10.3390/inorganics6010034 · Cited by 111
Metadata
- Authors
- Elam, J. W., Groner, M. D., & George, S. M.
- Venue
- Review of Scientific Instruments
- Publisher
- AIP Publishing
- Published
- 2002-08-01
- Volume
- 73
- Issue
- 8
- Pages
- 2981-2987
- ISSN
- 0034-6748 (ISSN-L)
- 1089-7623
- OpenAlex
- W1978389691
- Cited by
- 570
- References
- 0
- FWCI
- 13.67
- Type
- journal article
- Language
- en
- Open access
- closed
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- Elam, J. W., Groner, M. D., & George, S. M. (2002). Viscous flow reactor with quartz crystal microbalance for thin film growth by atomic layer deposition. Review of Scientific Instruments. https://doi.org/10.1063/1.1490410
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