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Fabrication of nanostructures with long-range order using block copolymer lithography
Abstract
Block copolymer lithography makes use of the self-assembling properties of block copolymers to pattern nanoscale features over large areas. Although the resulting patterns have good short-range order, the lack of long-range order limits their utility in some applications. This work presents a lithographically assisted self-assembly method that allows ordered arrays of nanostructures to be formed by spin casting a block copolymer over surfaces patterned with shallow grooves. The ordered block copolymer domain patterns are then transferred into an underlying silica film using a single etching step to create a well-ordered hierarchical structure consisting of arrays of silica pillars with 20 nm feature sizes and aspect ratios greater than 3.
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Citations
Cited by
Mesoporous carbon materials: Synthesis and modification
Liang, C., Li, Z., & Dai, S. (2008) · Angewandte Chemie International Edition · doi:10.1002/anie.200702046 · Cited by 1,935
Directing the self-assembly of block copolymers
Darling, S. B. (2007) · Progress in Polymer Science · doi:10.1016/j.progpolymsci.2007.05.004 · Cited by 1,019
Block copolymer based nanostructures: Materials, processes, and applications to electronics
Kim, H.-C., Park, S.-M., & Hinsberg, W. D. (2010) · Chemical Reviews · doi:10.1021/cr900159v · Cited by 1,017
Nanostructure fabrication using block copolymers
Hamley, I. W. (2003) · Nanotechnology · doi:10.1088/0957-4484/14/10/201 · Cited by 773
Templated Self‐Assembly of Block Copolymers: Top‐Down Helps Bottom‐Up
Cheng, J. Y., Ross, C. A., Smith, H. I., & Thomas, E. L. (2006) · Advanced Materials · doi:10.1002/adma.200502651 · Cited by 695
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Metadata
- Authors
- Cheng, J. Y., Ross, C. A., Thomas, E. L., Smith, H. I., & Vancso, G. J.
- Venue
- Applied Physics Letters
- Publisher
- AIP Publishing
- Published
- 2002-11-04
- Volume
- 81
- Issue
- 19
- Pages
- 3657-3659
- ISSN
- 0003-6951 (ISSN-L)
- 1077-3118
- OpenAlex
- W2020001809
- Cited by
- 415
- References
- 0
- FWCI
- 15.21
- Type
- journal article
- Language
- en
- Open access
- closed
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- Cheng, J. Y., Ross, C. A., Thomas, E. L., Smith, H. I., & Vancso, G. J. (2002). Fabrication of nanostructures with long-range order using block copolymer lithography. Applied Physics Letters. https://doi.org/10.1063/1.1519356
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