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Measurement of temperature distribution in multifinger AlGaN/GaN heterostructure field-effect transistors using micro-Raman spectroscopy

Kuball, M., Rajasingam, S., Sarua, A., Uren, M. J., Martin, T., Hughes, B. T., Hilton, K. P., Balmer, R. S.·2003·Applied Physics Letters

Abstract

The temperature distribution in multifinger high-power AlGaN/GaN heterostructure field-effect transistors grown on SiC substrates was studied. Micro-Raman spectroscopy was used to measure channel temperature with 1 μm spatial resolution, not possible using infrared techniques. Thermal resistance values were determined for four different device layouts with varying number of fingers, finger width, and spacing. The experimental thermal resistance was in fair agreement to that predicted by three-dimensional finite difference heat dissipation simulations. Uncertainties in thermal properties of this device system made simulation less reliable than experiment.

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Metadata

Authors
Kuball, M., Rajasingam, S., Sarua, A., Uren, M. J., Martin, T., Hughes, B. T., Hilton, K. P., & Balmer, R. S.
Venue
Applied Physics Letters
Published
2003-01-06
Volume
82
Issue
1
Pages
124-126
ISSN
  • 0003-6951 (ISSN-L)
  • 1077-3118
OpenAlex
W1971865152
Cited by
182
References
0
FWCI
8.85
Type
journal article
Language
en
Open access
closed

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CoChat. (2026). Citation check: Measurement of temperature distribution in multifinger AlGaN/GaN heterostructure field-effect transistors using micro-Raman spectroscopy. https://app.cochat.ai/papers/10.1063/1.1534935
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Kuball, M., Rajasingam, S., Sarua, A., Uren, M. J., Martin, T., Hughes, B. T., Hilton, K. P., & Balmer, R. S. (2003). Measurement of temperature distribution in multifinger AlGaN/GaN heterostructure field-effect transistors using micro-Raman spectroscopy. Applied Physics Letters. https://doi.org/10.1063/1.1534935

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