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Inductively coupled Ar/CH4/H2 plasmas for low-temperature deposition of ordered carbon nanostructures
Open accessAbstract
The results of numerical simulations, optical emission spectroscopy (OES), and quadrupole mass spectrometry (QMS) of inductively coupled Ar/CH4/H2 plasmas in the plasma enhanced chemical vapor deposition (PECVD) of self-assembled vertically aligned carbon nanostructures (CNs) are presented. A spatially averaged (global) discharge model is developed to study the densities and fluxes of the radical neutrals and charged species, the effective electron temperature, methane conversion factor under various growth conditions. The numerical results show a remarkable agreement with the OES and QMS data. It is found that the deposited cation fluxes in the PECVD of CNs generally exceed those of the radical neutrals.
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Cited by
Vladimirov, S. V., & Ostrikov, K. (2004) · Physics Reports · doi:10.1016/j.physrep.2003.12.003 · Cited by 332
Self-citationHigh‐Performance Plasma‐Enabled Biorefining of Microalgae to Value‐Added Products
Zhou, R., Zhou, R., Zhang, X., Fang, Z., Wang, X., Speight, R., Wang, H., Doherty, W., Cullen, P. J., Ostrikov, K. (., et al. (2019) · ChemSusChem · doi:10.1002/cssc.201901772 · Cited by 38
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Metadata
- Authors
- Denysenko, I. B., Xu, S., Long, J. D., Rutkevych, P. P., Azarenkov, N. A., & Ostrikov, K.
- Venue
- Journal of Applied Physics
- Publisher
- AIP Publishing
- Published
- 2004-03-01
- Volume
- 95
- Issue
- 5
- Pages
- 2713-2724
- ISSN
- 0021-8979 (ISSN-L)
- 1089-7550
- OpenAlex
- W98132313
- Cited by
- 263
- References
- 0
- FWCI
- 16.68
- Type
- journal article
- Language
- en
- Open access
- green
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- CoChat. (2026). Citation check: Inductively coupled Ar/CH4/H2 plasmas for low-temperature deposition of ordered carbon nanostructures. https://app.cochat.ai/papers/10.1063/1.1642762
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- Denysenko, I. B., Xu, S., Long, J. D., Rutkevych, P. P., Azarenkov, N. A., & Ostrikov, K. (2004). Inductively coupled Ar/CH4/H2 plasmas for low-temperature deposition of ordered carbon nanostructures. Journal of Applied Physics. https://doi.org/10.1063/1.1642762
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