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Temperature dependence of the band gap of silicon

Bludau, W., Onton, A., Heinke, W.·1974·Journal of Applied Physics

Abstract

The band-gap energy Eg of silicon has been reevaluated with high precision between 2 and 300 K by the following method: the derivative of the absorption coefficient, resulting from free-exciton absorption, has a well-defined singularity, which can be detected unambiguously by wavelength-modulation spectroscopy. The energy of this singularity yields the band gap. Our data deviated by more than 5 meV from the earlier results of MacFarlane et al. and Haynes et al. and fell between their Eg(T) curves. The approximation of Eg(T) = A + BT + CT2 gives A = 1.170 eV, B = 1.059×10−5 eV/K, and C = −6.05×10−7 eV/K2, for 0<T≤190 K, and A = 1.1785 eV, B = −9.025×10−5 eV/K, and C = −3.05×10−7 eV/K2, for 150≤T≤300 K, which fits our data within 0.2 meV. The major uncertainty of about 1 meV lies in the energies of exciton and TO phonon.

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Metadata

Authors
Bludau, W., Onton, A., & Heinke, W.
Venue
Journal of Applied Physics
Published
1974-04-01
Volume
45
Issue
4
Pages
1846-1848
ISSN
  • 0021-8979 (ISSN-L)
  • 1089-7550
OpenAlex
W2094087345
Cited by
578
References
0
FWCI
6.15
Type
journal article
Language
en
Open access
closed

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CoChat. (2026). Citation check: Temperature dependence of the band gap of silicon. https://app.cochat.ai/papers/10.1063/1.1663501
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Bludau, W., Onton, A., & Heinke, W. (1974). Temperature dependence of the band gap of silicon. Journal of Applied Physics. https://doi.org/10.1063/1.1663501

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