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Thermal and Electrical Properties of Heavily Doped Ge-Si Alloys up to 1300°K

Dismukes, J. P., Ekstrom, L., Steigmeier, E. F., Kudman, I., Beers, D. S.·1964·Journal of Applied Physics

Abstract

The thermal resistivity, Seebeck coefficient, electrical resistivity, and Hall mobility of Ge-Si alloys have been measured throughout the Ge-Si alloy system as functions of impurity concentration in the range 2×1018−4×1020cm−3, and of temperature in the range 300°–1300°K. A qualitative interpretation of these properties is given. For power conversion, boron and phosphorus were found to be useful p-type and n-type impurities, respectively, because of their high solid solubilities. At 1200°K, the maximum values of the dimensionless figure of merit zT were 0.8 for p-type Ge0.15-Si0.85 alloy doped to 2.1×1020cm−3 holes, and 1.0 for n-type Ge0.15-Si0.85 alloy doped to 2.7×1020cm−3 electrons. The maximum over-all efficiency of a stable generator operating between 300°–1200°K, using the best p-type and n-type materials was computed to be 10%.

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Metadata

Authors
Dismukes, J. P., Ekstrom, L., Steigmeier, E. F., Kudman, I., & Beers, D. S.
Venue
Journal of Applied Physics
Published
1964-10-01
Volume
35
Issue
10
Pages
2899-2907
ISSN
  • 0021-8979 (ISSN-L)
  • 1089-7550
OpenAlex
W2019473624
Cited by
595
References
0
FWCI
3.95
Type
journal article
Language
en
Open access
closed

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CoChat. (2026). Citation check: Thermal and Electrical Properties of Heavily Doped Ge-Si Alloys up to 1300°K. https://app.cochat.ai/papers/10.1063/1.1713126
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Dismukes, J. P., Ekstrom, L., Steigmeier, E. F., Kudman, I., & Beers, D. S. (1964). Thermal and Electrical Properties of Heavily Doped Ge-Si Alloys up to 1300°K. Journal of Applied Physics. https://doi.org/10.1063/1.1713126

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