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Surface plasmon resonant interference nanolithography technique
Abstract
We demonstrate a promising nanofabrication method, used to fabricate fine patterns beyond the diffraction limit, by employing surface plasmon polariton (SPP) resonance. Sub-100 nm lines were patterned photolithographically using surface plasmon polaritonic interference in the optical near field excited by a wavelength of 436 nm. The unperforated metallic mask approach which has corrugated surfaces on both sides is proposed for arbitrary patterning. The corrugated surface of the metallic mask on the illuminated side collects light through SPP coupling, and SPP on the exit side of metallic mask redistributes the light into nanoscale spatial distribution, which can be used to fabricate nanostructures. Preliminary numerical simulations support the experimental results.
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Cites
Optical Constants of the Noble Metals
Johnson, P. B., & Christy, R. W. (1972) · Physical Review B · doi:10.1103/physrevb.6.4370 · Cited by 20,094
Negative Refraction Makes a Perfect Lens
Pendry, J. B. (2000) · Physical Review Letters · doi:10.1103/physrevlett.85.3966 · Cited by 12,159
Cited by
Principles of electromagnetic waves in metasurfaces
Luo, X. (2015) · Science China Physics, Mechanics & Astronomy · doi:10.1007/s11433-015-5688-1 · Cited by 580
Self-citationUltrathin Nanostructured Metals for Highly Transmissive Plasmonic Subtractive Color Filters
Zeng, B., Gao, Y., & Bartoli, F. J. (2013) · Scientific Reports · doi:10.1038/srep02840 · Cited by 291
Metadata
- Authors
- Luo, X., & Ishihara, T.
- Venue
- Applied Physics Letters
- Publisher
- AIP Publishing
- Published
- 2004-06-07
- Volume
- 84
- Issue
- 23
- Pages
- 4780-4782
- ISSN
- 0003-6951 (ISSN-L)
- 1077-3118
- OpenAlex
- W2018586229
- Cited by
- 570
- References
- 2
- FWCI
- 17.16
- Type
- journal article
- Language
- en
- Open access
- closed
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