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Parallel silicide contacts

Ohdomari, I., Tu, K. N.·1980·Journal of Applied Physics

Abstract

Parallel silicide contacts consisting of PtSi and NiSi with fixed ratios of contact areas were prepared for current-voltage and capacitance-voltage measurements of Schottky barrier height. These measurements were analyzed with models assuming a linear combination of thermionic emission currents or junction capacitances. The measured and the computed values of barrier height have been found to agree very well. A systematic diagnosis of parallel contacts under a variety of conditions is presented in the Appendix.

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Metadata

Authors
Ohdomari, I., & Tu, K. N.
Venue
Journal of Applied Physics
Published
1980-07-01
Volume
51
Issue
7
Pages
3735-3739
ISSN
  • 0021-8979 (ISSN-L)
  • 1089-7550
OpenAlex
W2090958407
Cited by
210
References
0
FWCI
4.26
Type
journal article
Language
en
Open access
closed

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CoChat. (2026). Citation check: Parallel silicide contacts. https://app.cochat.ai/papers/10.1063/1.328160
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Ohdomari, I., & Tu, K. N. (1980). Parallel silicide contacts. Journal of Applied Physics. https://doi.org/10.1063/1.328160

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Contains information from the Semantic Scholar Academic Graph Datasets, made available under the ODC Attribution License (ODC-BY 1.0).

Semantic Scholar’s data is described in: Kinney, R., et al. (2023). The Semantic Scholar Open Data Platform. arXiv:2301.10140.