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Cited by 275

The DOI matches its Crossref record; 9 of the 9 references it cites were found in a registry or an index.

Properties of Al x Ga1−x N films prepared by reactive molecular beam epitaxy

Yoshida, S., Misawa, S., Gonda, S.·1982·Journal of Applied Physics

Abstract

Single-crystal films of the solid solution AlxGa1−xN of the entire composition range have been fabricated on sapphire and silicon substrates by reactive molecular beam epitaxy (MBE) at 700 °C. The properties of the films have been studied by the reflection high energy electron diffraction technique, x-ray diffraction, and electrical and optical measurements. The lattice constant of the film is not a linear function of the composition, and the fundamental absorption edge also shows nonlinear dependence on the composition. The narrow intense peak of the cathodoluminescence concerned with the band to band or shallow impurity band transition, varies from 3.4 to 6 eV with the composition, which suggests the feasibility of AlxGa1−xN films grown by reactive MBE for optical devices in the ultraviolet spectral region.

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Crossref · 10.1063/1.329998

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Metadata

Authors
Yoshida, S., Misawa, S., & Gonda, S.
Venue
Journal of Applied Physics
Published
1982-10-01
Volume
53
Issue
10
Pages
6844-6848
ISSN
  • 0021-8979 (ISSN-L)
  • 1089-7550
OpenAlex
W1974307205
Cited by
275
References
9
FWCI
1.62
Type
journal article
Language
en
Open access
closed

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CoChat. (2026). Citation check: Properties of Al x Ga1−x N films prepared by reactive molecular beam epitaxy. https://app.cochat.ai/papers/10.1063/1.329998
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Yoshida, S., Misawa, S., & Gonda, S. (1982). Properties of Al x Ga1−x N films prepared by reactive molecular beam epitaxy. Journal of Applied Physics. https://doi.org/10.1063/1.329998

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Contains information from the Semantic Scholar Academic Graph Datasets, made available under the ODC Attribution License (ODC-BY 1.0).

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