Cited by 55Semiconductor materials and interfacesSilicon and Solar Cell TechnologiesAdvanced Semiconductor Detectors and Materials

Far-infrared absorption of silicon crystals

Ohba, Tetsuhiko, Ikawa, Shun-ichi·1988·Journal of Applied Physics

Abstract

Far-infrared absorption coefficients of silicon crystals grown by the Czochralski method (CZ) and by the floating-zone method (FZ) in the range of 20–200 cm−1 were obtained from transmission measurements at two different thicknesses, allowing for the effect of the multiple internal reflection. The CZ and FZ specimens used were not intentionally doped and had dc resistivities of 9.4±0.3 Ω cm and (5±2)×104 Ω cm, respectively. The impurity-induced absorption of the CZ crystal is well explained by the Drude model, while the FZ crystal showed only a weak absorption which is attributed to a wing of the intrinsic lattice band of silicon.

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Crossref · 10.1063/1.341325

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References 10 · Cited by 55

Authors
Ohba, T., & Ikawa, S.-I.
Affiliations
Hokkaido University (JP)
Venue
Journal of Applied Physics
Published
1988-10-15
Volume
64
Issue
8
Pages
4141-4143
ISSN
  • 0021-8979 (ISSN-L)
  • 1089-7550
OpenAlex
W1981277188
Cited by
55
References
10
Citations by year
2025: 2 · 2022: 1 · 2021: 2 · 2020: 2 · 2018: 3 · 2017: 4 · 2016: 3 · 2015: 3 · 2014: 1 · 2013: 3
FWCI
0.90
Type
journal article
Language
en
Open access
closed
Locations
Journal of Applied Physics (publishedVersion)
Topics
  • Physical Sciences › Physics and Astronomy › Atomic and Molecular Physics, and Optics › Semiconductor materials and interfaces
  • Physical Sciences › Engineering › Electrical and Electronic Engineering › Silicon and Solar Cell Technologies
  • Physical Sciences › Engineering › Electrical and Electronic Engineering › Advanced Semiconductor Detectors and Materials
Keywords
far-infrared absorption, silicon crystals, Czochralski crystal growth, floating zone crystal growth, absorption coefficient, multiple internal reflections, Drude model, impurity absorption, electrical resistivity

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