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Simulation of multilevel switching in electrochemical metallization memory cells

Menzel, Stephan, Böttger, Ulrich, Waser, Rainer·2012·Journal of Applied Physics

Abstract

We report on a simulation model for bipolar resistive switching in cation-migration based memristive devices. The model is based on the electrochemical driven growth and dissolution of a metallic filament. The origin of multilevel switching is proposed to be direct tunneling between the growing filament and the counter electrode. An important result of our parameter simulation studies is that different materials show the same experimental multilevel behavior. Our model fully reproduces the experimental data and allows for an explanation of the transition from bipolar to nonpolar switching.

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Research works printed but not linked: 19

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Metadata

Authors
Menzel, S., Böttger, U., & Waser, R.
Venue
Journal of Applied Physics
Published
2012-01-01
Volume
111
Issue
1
ISSN
  • 0021-8979 (ISSN-L)
  • 1089-7550
OpenAlex
W2009604146
Cited by
166
References
5
FWCI
14.04
Type
journal article
Language
en
Open access
closed

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CoChat. (2026). Citation check: Simulation of multilevel switching in electrochemical metallization memory cells. https://app.cochat.ai/papers/10.1063/1.3673239
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Menzel, S., Böttger, U., & Waser, R. (2012). Simulation of multilevel switching in electrochemical metallization memory cells. Journal of Applied Physics. https://doi.org/10.1063/1.3673239

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Contains information from the Semantic Scholar Academic Graph Datasets, made available under the ODC Attribution License (ODC-BY 1.0).

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