The DOI matches its Crossref record; 103 of the 103 references it cites were found in a registry or an index.
New development of atomic layer deposition: processes, methods and applications
Open accessAbstract
Atomic layer deposition (ALD) is an ultra-thin film deposition technique that has found many applications owing to its distinct abilities. They include uniform deposition of conformal films with controllable thickness, even on complex three-dimensional surfaces, and can improve the efficiency of electronic devices. This technology has attracted significant interest both for fundamental understanding how the new functional materials can be synthesized by ALD and for numerous practical applications, particularly in advanced nanopatterning for microelectronics, energy storage systems, desalinations, catalysis and medical fields. This review introduces the progress made in ALD, both for computational and experimental methodologies, and provides an outlook of this emerging technology in comparison with other film deposition methods. It discusses experimental approaches and factors that affect the deposition and presents simulation methods, such as molecular dynamics and computational fluid dynamics, which help determine and predict effective ways to optimize ALD processes, hence enabling the reduction in cost, energy waste and adverse environmental impacts. Specific examples are chosen to illustrate the progress in ALD processes and applications that showed a considerable impact on other technologies.
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Science and technology for water purification in the coming decades
Shannon, M. A., Bohn, P. W., Elimelech, M., Georgiadis, J. G., Mariñas, B. J., & Mayes, A. M. (2008) · Nature · doi:10.1038/nature06599 · Cited by 8,465
Structural absorption by barbule microstructures of super black bird of paradise feathers
McCoy, D. E., Feo, T., Harvey, T. A., & Prum, R. O. (2018) · Nature Communications · doi:10.1038/s41467-017-02088-w · Cited by 7,424
Raman spectroscopy as a versatile tool for studying the properties of graphene
Ferrari, A. C., & Basko, D. M. (2013) · Nature Nanotechnology · doi:10.1038/nnano.2013.46 · Cited by 7,405
Thermal properties of graphene and nanostructured carbon materials
Balandin, A. A. (2011) · Nature Materials · doi:10.1038/nmat3064 · Cited by 6,244
The Art of Molecular Dynamics Simulation
Rapaport, D. C. (2004) · Cambridge University Press eBooks · doi:10.1017/cbo9780511816581 · Cited by 4,037
The ReaxFF reactive force-field: development, applications and future directions
Senftle, T. P., Hong, S., Islam, M. M., Kylasa, S. B., Zheng, Y., Shin, Y. K., Junkermeier, C., Engel-Herbert, R., Janik, M. J., Aktulga, H. M., et al. (2016) · npj Computational Materials · doi:10.1038/npjcompumats.2015.11 · Cited by 2,363
Water Desalination across Nanoporous Graphene
Cohen-Tanugi, D., & Grossman, J. C. (2012) · Nano Letters · doi:10.1021/nl3012853 · Cited by 2,204
Lee, K. P., Arnot, T. C., & Mattia, D. (2011) · Journal of Membrane Science · doi:10.1016/j.memsci.2010.12.036 · Cited by 2,148
Evaporation-Induced Self-Assembly: Nanostructures Made Easy
Brinker, C. J., Lu, Y., Sellinger, A., & Fan, H. (1999) · Advanced Materials · doi:10.1002/(sici)1521-4095(199905)11:7<579::aid-adma579>3.0.co;2-r · Cited by 2,079
A review of water treatment membrane nanotechnologies
Pendergast, M. M., & Hoek, E. M. V. (2011) · Energy & Environmental Science · doi:10.1039/c0ee00541j · Cited by 2,078
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Krishna, K. G., Parne, S., Pothukanuri, N., Kathirvelu, V., Gandi, S., & Joshi, D. (2022) · Sensors and Actuators A: Physical · doi:10.1016/j.sna.2022.113578 · Cited by 380
Atomic layer deposition and its derivatives for extreme ultraviolet (EUV) photoresist applications
Le, D. N., Park, T., Hwang, S. M., Kim, J.-H., Jung, Y. C., Tiwale, N., Subramanian, A., Lee, W.-I., Choi, R., Sung, M. M., et al. (2023) · Japanese Journal of Applied Physics · doi:10.35848/1347-4065/acce43 · Cited by 26
Metadata
- Authors
- Oviroh, P. O., Akbarzadeh, R., Pan, D., Coetzee, R. A. M., & Jen, T.-C.
- Venue
- Science and Technology of Advanced Materials
- Publisher
- Informa UK Limited
- Published
- 2019-05-23
- Volume
- 20
- Issue
- 1
- Pages
- 465-496
- ISSN
- 1468-6996 (ISSN-L)
- 1878-5514
- OpenAlex
- W2941296407
- Cited by
- 536
- References
- 103
- FWCI
- 18.15
- Type
- journal article
- Language
- en
- Open access
- gold
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- Oviroh, P. O., Akbarzadeh, R., Pan, D., Coetzee, R. A. M., & Jen, T.-C. (2019). New development of atomic layer deposition: processes, methods and applications. Science and Technology of Advanced Materials. https://doi.org/10.1080/14686996.2019.1599694
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Contains information from the Semantic Scholar Academic Graph Datasets, made available under the ODC Attribution License (ODC-BY 1.0).
Semantic Scholar’s data is described in: Kinney, R., et al. (2023). The Semantic Scholar Open Data Platform. arXiv:2301.10140.
