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Structural and electrical properties of Fe-doped thin films
Open accessAbstract
The present study discusses the effect of iron doping in thin films deposited by rf sputtering. Iron doping induces a structural transformation from anatase to rutile and electrical measurements indicate that iron acts as an acceptor impurity. Thermoelectric power measurement shows a transition between n-type and p-type electrical conduction for an iron concentration around 0.13 at.%. The highest p-type conductivity at room temperature achieved by iron doping was .
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Metadata
- Authors
- Bally, A. R., Korobeinikova, E. N., Schmid, P. E., Lévy, F., & Bussy, F.
- Venue
- Journal of Physics D: Applied Physics
- Publisher
- IOP Publishing
- Published
- 1998-05-21
- Volume
- 31
- Issue
- 10
- Pages
- 1149-1154
- ISSN
- 0022-3727 (ISSN-L)
- 1361-6463
- OpenAlex
- W2020954975
- Cited by
- 177
- References
- 0
- FWCI
- 3.94
- Type
- journal article
- Language
- en
- Open access
- bronze
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- Bally, A. R., Korobeinikova, E. N., Schmid, P. E., Lévy, F., & Bussy, F. (1998). Structural and electrical properties of Fe-doped thin films. Journal of Physics D: Applied Physics. https://doi.org/10.1088/0022-3727/31/10/004
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Contains information from the Semantic Scholar Academic Graph Datasets, made available under the ODC Attribution License (ODC-BY 1.0).
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