The DOI matches its Crossref record; 2 of the 2 references it cites were found in a registry or an index.
The use of high aspect ratio photoresist (SU-8) for super-hydrophobic pattern prototyping
Open accessAbstract
In this work we present a reliable technique for the production of large areas of high aspect-ratio patterns and describe their use as model super-hydrophobic systems. The high thickness and straight sidewalls possible with SU-8 were used to generate dense patterns of small pillars. These photoresist patterns could be used directly, without the need for micromoulding. A method is given allowing resist thickness to be varied over a wide range and a bottom antireflective layer was used to simplify patterning on reflective substrates. This patterning technique allows rapid testing of wetting theories, as pattern size and depth can be varied simply and samples can be produced in sufficient numbers for laboratory use. We show how the static contact angle of water varies with pattern height for one sample-pattern and how static and dynamic contact angles vary with dimension using high aspect-ratio patterns.
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Citations
Cites
Wettability of porous surfaces
Cassie, A. B. D., & Baxter, S. (1944) · Transactions of the Faraday Society · doi:10.1039/tf9444000546 · Cited by 13,807
RESISTANCE OF SOLID SURFACES TO WETTING BY WATER
Wenzel, R. N. (1936) · Industrial & Engineering Chemistry · doi:10.1021/ie50320a024 · Cited by 13,316
Cited by
Progess in superhydrophobic surface development
Roach, P., Shirtcliffe, N. J., & Newton, M. I. (2008) · Soft Matter · doi:10.1039/b712575p · Cited by 1,615
Self-citationRoach, P., Farrar, D., & Perry, C. C. (2006) · Journal of the American Chemical Society · doi:10.1021/ja056278e · Cited by 772
Self-citationAnalysis of Droplet Evaporation on a Superhydrophobic Surface
McHale, G., Aqil, S., Shirtcliffe, N. J., Newton, M. I., & Erbil, H. Y. (2005) · Langmuir · doi:10.1021/la0518795 · Cited by 409
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Metadata
- Authors
- Shirtcliffe, N. J., Aqil, S., Evans, C., McHale, G., Newton, M. I., Perry, C. C., & Roach, P.
- Venue
- Journal of Micromechanics and Microengineering
- Publisher
- IOP Publishing
- Published
- 2004-07-14
- Volume
- 14
- Issue
- 10
- Pages
- 1384-1389
- ISSN
- 0960-1317 (ISSN-L)
- 1361-6439
- OpenAlex
- W1972811863
- Cited by
- 171
- References
- 2
- FWCI
- 5.17
- Type
- journal article
- Language
- en
- Open access
- bronze
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- Shirtcliffe, N. J., Aqil, S., Evans, C., McHale, G., Newton, M. I., Perry, C. C., & Roach, P. (2004). The use of high aspect ratio photoresist (SU-8) for super-hydrophobic pattern prototyping. Journal of Micromechanics and Microengineering. https://doi.org/10.1088/0960-1317/14/10/013
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Contains information from the Semantic Scholar Academic Graph Datasets, made available under the ODC Attribution License (ODC-BY 1.0).
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