The DOI matches its Crossref record; 12 of the 12 references it cites were found in a registry or an index.
Recent developments in micromilling using focused ion beam technology
Abstract
The application of focused ion beam (FIB) technology in microfabrication has become increasingly popular. Its use in microfabrication has advantages over contemporary photolithography or other micromachining technologies, such as small feature resolution, the ability to process without masks and being accommodating for a variety of materials and geometries. An overview of the recent development in FIB microfabrication technology is given. The emphasis will be on direct milling, or maskless techniques, and this can distinguish the FIB technology from the contemporary photolithography process and provide a vital alternative to it. After an introduction to the technology and its FIB principles, the recent developments in using milling techniques for making various high-quality devices and high-precision components at the micrometer scale are examined and discussed. Finally, conclusions are presented to summarize the reviewed work and to suggest the areas for improving the FIB milling technology and for future research.
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Citations
Cites
Fundamentals of Microfabrication
(2016) · Micromechatronics · doi:10.1201/b15830-17 · Cited by 2,109
Fundamentals of Microfabrication
Madou, M. J. (2018) · CRC Press eBooks · doi:10.1201/9781482274004 · Cited by 2,020
A review of focused ion beam applications in microsystem technology
Reyntjens, S., & Puers, R. (2001) · Journal of Micromechanics and Microengineering · doi:10.1088/0960-1317/11/4/301 · Cited by 683
Focused ion beam technology and applications
Melngailis, J. (1987) · Journal of Vacuum Science & Technology B: Microelectronics Processing and Phenomena · doi:10.1116/1.583937 · Cited by 615
Electron beam lithography in nanoscale fabrication: recent development
Tseng, A. A., Chen, K., Chen, C. D., & Ma, K. J. (2003) · IEEE Transactions on Electronics Packaging Manufacturing · doi:10.1109/tepm.2003.817714 · Cited by 532
Self-citationCollection and sputtering experiments with noble gas ions
Almén, O., & Bruce, G. (1961) · Nuclear Instruments and Methods · doi:10.1016/0029-554x(61)90026-x · Cited by 415
Limitations of focused ion beam nanomachining
Lehrer, C., Frey, L., Petersen, S., & Ryssel, H. (2001) · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · doi:10.1116/1.1417553 · Cited by 98
Focused ion beam sputter yield change as a function of scan speed
Santamore, D., Edinger, K., Orloff, J. H., & Melngailis, J. (1997) · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · doi:10.1116/1.589643 · Cited by 64
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Cited by
Evolution in Lithography Techniques: Microlithography to Nanolithography
Sharma, E., Rathi, R., Misharwal, J., Sinhmar, B., Kumari, S., Dalal, J., & Kumar, A. (2022) · Nanomaterials · doi:10.3390/nano12162754 · Cited by 257
Li, X., Wu, Y., Hang, L., Men, D., Cai, W., & Li, Y. (2015) · Journal of Materials Chemistry C · doi:10.1039/c4tc02228a · Cited by 19
Metadata
- Authors
- Tseng, A. A.
- Venue
- Journal of Micromechanics and Microengineering
- Publisher
- IOP Publishing
- Published
- 2004-01-19
- Volume
- 14
- Issue
- 4
- Pages
- R15-R34
- ISSN
- 0960-1317 (ISSN-L)
- 1361-6439
- OpenAlex
- W2130353331
- Cited by
- 411
- References
- 12
- FWCI
- 23.16
- Type
- journal article
- Language
- en
- Open access
- closed
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Contains information from the Semantic Scholar Academic Graph Datasets, made available under the ODC Attribution License (ODC-BY 1.0).
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