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Electron beam lithography in nanoscale fabrication: recent development
Abstract
Miniaturization is the central theme in modern fabrication technology. Many of the components used in modern products are getting smaller and smaller. In this paper, the recent development of the electron beam lithography technique is reviewed with an emphasis on fabricating devices at the nanometer scale. Because of its very short wavelength and reasonable energy density characteristics, e-beam lithography has the ability to fabricate patterns having nanometer feature sizes. As a result, many nanoscale devices have been successfully fabricated by this technique. Following an introduction of this technique, recent developments in processing, tooling, resist, and pattern controlling are separately examined and discussed. Examples of nanodevices made by several different e-beam lithographic schemes are given, to illustrate the versatility and advancement of the e-beam lithography technique. Finally, future trends in this technique are discussed.
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Cites
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Metadata
- Authors
- Tseng, A. A., Chen, K., Chen, C. D., & Ma, K. J.
- Venue
- IEEE Transactions on Electronics Packaging Manufacturing
- Published
- 2003-04
- Volume
- 26
- Issue
- 2
- Pages
- 141-149
- ISSN
- 1521-334X (ISSN-L)
- OpenAlex
- W2129216969
- Cited by
- 532
- References
- 6
- FWCI
- 6.37
- Type
- journal article
- Language
- en
- Open access
- closed
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