The DOI matches its Crossref record.
Review of inductively coupled plasmas for plasma processing
Abstract
The need for large-area, high-density plasma sources for plasma-aided manufacturing of integrated circuits has created a renewed interest in inductively coupled plasmas (ICPs). Several ICP reactor geometries are briefly reviewed. Typically, inductive coupling of RF power (0.5-28 MHz) can produce ion densities in excess of 10 12 cm -3 even at submillitorr pressures. Existing electromagnetic field models of ICPs are examined and found to be in reasonable agreement with experimental results. Sputter deposition, anodic silicon oxidation and polymer etching using ICPs are also described. It is concluded that ICPs are promising candidates for meeting the future requirements of plasma processing, although considerable process development, plasma characterization and modelling are still needed.
Overview
The claims and statistics of this paper haven’t been checked yet.
Run the check — free, no account needed. It reads the open-access text and checks the sources it cites.
Integrity signals
Registry
Cites
Statistics
Verification
Claims the paper makes
The claims and statistics of this paper haven’t been checked yet.
Run the check — free, no account needed. It reads the open-access text and checks the sources it cites.
Self-check
Percentages, sums and reported differences re-computed from the paper’s own numbers.
The self-check needs the paper’s full text.
Citations
Cited by
Ionized physical vapor deposition (IPVD): A review of technology and applications
Helmersson, U., Lattemann, M., Bohlmark, J., Ehiasarian, A. P., & Gudmundsson, J. T. (2006) · Thin Solid Films · doi:10.1016/j.tsf.2006.03.033 · Cited by 1,081
Physics and technology of magnetron sputtering discharges
Gudmundsson, J. T. (2020) · Plasma Sources Science and Technology · doi:10.1088/1361-6595/abb7bd · Cited by 532
Mattei, S., Nishida, K., Onai, M., Lettry, J., Tran, M. Q., & Hatayama, A. (2017) · Journal of Computational Physics · doi:10.1016/j.jcp.2017.09.015 · Cited by 61
Metadata
- Authors
- Hopwood, J.
- Venue
- Plasma Sources Science and Technology
- Publisher
- IOP Publishing
- Published
- 1992-05-01
- Volume
- 1
- Issue
- 2
- Pages
- 109-116
- ISSN
- 0963-0252 (ISSN-L)
- 1361-6595
- OpenAlex
- W2008225124
- Cited by
- 690
- References
- 0
- FWCI
- 18.19
- Type
- journal article
- Language
- en
- Open access
- closed
About these checks
Registry, retraction, Cites and statistics results are computed, not judged, with one exception: a printed reference that no index lists is read once by a model before it counts as a citation error. Claims are extracted by a model and kept only when their quote appears verbatim in the text; each cited source is then checked, with a model’s help, for whether it says what the claim relies on. Those verdicts can be wrong — read the claim’s quote and the cited source before relying on one.
Statistics and arithmetic are recomputed, not judged.
Confidence bands are shown only for fields calibrated on our annotated test set. None is calibrated yet, so no band is shown.
What counts as a claim ›How we measure confidence ›How we check this ›
Are you an author, or do you see a problem with this page? Request a review
How to cite
Cite CoChat for the checks on this page, and the paper for its own findings.
- This page
- CoChat. (2026). Citation check: Review of inductively coupled plasmas for plasma processing. https://app.cochat.ai/papers/10.1088/0963-0252/1/2/006
- The paper
- Hopwood, J. (1992). Review of inductively coupled plasmas for plasma processing. Plasma Sources Science and Technology. https://doi.org/10.1088/0963-0252/1/2/006
Data sources
Bibliographic data: Semantic Scholar, OpenAlex, Crossref.
Contains information from the Semantic Scholar Academic Graph Datasets, made available under the ODC Attribution License (ODC-BY 1.0).
Semantic Scholar’s data is described in: Kinney, R., et al. (2023). The Semantic Scholar Open Data Platform. arXiv:2301.10140.
