The DOI matches its Crossref record; 31 of the 31 references it cites were found in a registry or an index.
Ionized physical vapor deposition (IPVD): A review of technology and applications
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Citations
Cites
CRC Handbook of Chemistry and Physics
(2014) · doi:10.1201/b17118 · Cited by 57,706
Principles of Plasma Discharges and Materials Processing
Lieberman, M. A., & Lichtenberg, A. J. (2005) · doi:10.1002/0471724254 · Cited by 4,748
Magnetron sputtering: a review of recent developments and applications
Kelly, P. J., & Arnell, R. D. (2000) · Vacuum · doi:10.1016/s0042-207x(99)00189-x · Cited by 2,136
(2018) · Physics Subject Headings (PhySH) · doi:10.29172/a5866236-c99c-4828-b499-4f50cccf7a2b · Cited by 1,992
Hass, G., & Gerstenberg, D. (1964) · Journal of The Electrochemical Society · doi:10.1149/1.2426128 · Cited by 1,754
A novel pulsed magnetron sputter technique utilizing very high target power densities
Kouznetsov, V., Macák, K., Schneider, J. M., Helmersson, U., & Petrov, I. (1999) · Surface and Coatings Technology · doi:10.1016/s0257-8972(99)00292-3 · Cited by 1,080
Self-citationTitanium aluminum nitride films: A new alternative to TiN coatings
Münz, W. (1986) · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · doi:10.1116/1.573713 · Cited by 965
Fundamental understanding and modeling of reactive sputtering processes
Berg, S., & Nyberg, T. (2005) · Thin Solid Films · doi:10.1016/j.tsf.2004.10.051 · Cited by 726
Review of inductively coupled plasmas for plasma processing
Hopwood, J. (1992) · Plasma Sources Science and Technology · doi:10.1088/0963-0252/1/2/006 · Cited by 690
Cathode spots of electric arcs
Jüttner, B. (2001) · Journal of Physics D Applied Physics · doi:10.1088/0022-3727/34/17/202 · Cited by 437
Cited by
Physics and technology of magnetron sputtering discharges
Gudmundsson, J. T. (2020) · Plasma Sources Science and Technology · doi:10.1088/1361-6595/abb7bd · Cited by 532
Self-citationAnders, A. (2014) · Applied Physics Letters · doi:10.1063/1.4904713 · Cited by 55
Metadata
- Authors
- Helmersson, U., Lattemann, M., Bohlmark, J., Ehiasarian, A. P., & Gudmundsson, J. T.
- Venue
- Thin Solid Films
- Publisher
- Elsevier BV
- Published
- 2006-08
- Volume
- 513
- Issue
- 1-2
- Pages
- 1-24
- ISSN
- 0040-6090 (ISSN-L)
- OpenAlex
- W2161508873
- Cited by
- 1,081
- References
- 31
- FWCI
- 37.79
- Type
- journal article
- Language
- en
- Open access
- green
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- CoChat. (2026). Citation check: Ionized physical vapor deposition (IPVD): A review of technology and applications. https://app.cochat.ai/papers/10.1016/j.tsf.2006.03.033
- The paper
- Helmersson, U., Lattemann, M., Bohlmark, J., Ehiasarian, A. P., & Gudmundsson, J. T. (2006). Ionized physical vapor deposition (IPVD): A review of technology and applications. Thin Solid Films. https://doi.org/10.1016/j.tsf.2006.03.033
Data sources
Bibliographic data: Semantic Scholar, OpenAlex, Crossref.
Contains information from the Semantic Scholar Academic Graph Datasets, made available under the ODC Attribution License (ODC-BY 1.0).
Semantic Scholar’s data is described in: Kinney, R., et al. (2023). The Semantic Scholar Open Data Platform. arXiv:2301.10140.
