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Cited by 8Photocathodes and Microchannel PlatesElectron and X-Ray Spectroscopy TechniquesAtomic and Molecular Physics

A comprehensive analysis of electron emission from a-Si:H/Al 2 O 3 at low energies

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Löffler, Janina, Belhaj, Mohamed, Bundaleski, Nenad, Diaz Leon, Juan J, Thomet, Jonathan, Frey, Samira, Ballif, Christophe, Wyrsch, Nicolas·2023·Journal of Physics D: Applied Physics
DOI 10.1088/1361-6463/acaf37
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Abstract

Recently developed microchannel plates (MCPs) based on amorphous silicon offer potential advantages with respect to glass based ones. In this context, secondary electron emission (SEE) at very low energies below 100 eV has been studied for relevant materials for these novel devices. The aim of this work was to quantify the low energy electron emission—secondary emission and elastic scattering—from amorphous silicon and alumina and the dependence of the emission energy distribution on the primary electron energy, which was previously unknown. Secondary emission and energy distribution were both modelled and measured using equipment particularly designed for this energy range. The effects of roughness, angle of incidence and surface composition were analysed. We show crossover energies as well as the angular dependence of electron emission from amorphous silicon and alumina, with a maximum experimental emission yield value of 2 and 2.8, respectively, at an incident angle of 75 ∘ . A parameterization for the energy dependence of the emission energy spectrum at low energies was derived. This extensive analysis is fundamental for a comprehensive understanding of the performance of amorphous silicon-based MCP detectors. It provides a complete model for SEE for a detailed description of the detector operation. The present results thus set the basis for a simulation framework, which is an essential element to increase the performance of these detectors and enable further developments.

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  • A polytropic electron model based on a single coefficient γ cannot capture correctly the kinetic physics of unmagnetized plasma plume expansions and introduces errors even in macroscopic quantities such as the electric potential and the ion density, especially in the plume peripheral and backflow regions.

    “It is therefore not surprising that a polytropic electron model based on a single coefficient γ cannot capture correctly the above physics and introduces errors even in macroscopic quantities such as the electric potential and the ion density, especially in the plume peripheral and backflow regions.”

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Authors
Löffler, J., Belhaj, M., Bundaleski, N., Diaz Leon, J. J., Thomet, J., Frey, S., Ballif, C., & Wyrsch, N.
Affiliations
  • HES-SO University of Applied Sciences and Arts Western Switzerland (CH)
  • Office National d'Études et de Recherches Aérospatiales (FR)
  • Universidade Nova de Lisboa (PT)
  • École Polytechnique Fédérale de Lausanne (CH)
  • Swiss Center for Electronics and Microtechnology (Switzerland) (CH)
Corresponding author
Löffler, Janina
ORCID
Venue
Journal of Physics D: Applied Physics
Publisher
IOP Publishing
Published
2023-01-24
Volume
56
Issue
6
Pages
065306
ISSN
  • 0022-3727 (ISSN-L)
  • 1361-6463
DOI
10.1088/1361-6463/acaf37
OpenAlex
W4313367048
Cited by
8
References
0
Citations by year
2026: 2 · 2025: 4 · 2024: 1 · 2023: 1
FWCI
0.44
Type
journal article
Language
en
Open access
Licence
Locations
  • Journal of Physics D Applied Physics (publishedVersion)
  • HAL (submittedVersion, other-oa)
  • ArODES (HES-SO (https://www.hes-so.ch/)) (submittedVersion)
  • Infoscience (Ecole Polytechnique Fédérale de Lausanne) (submittedVersion, cc-by-nc-nd)
Funders
  • National Science Foundation (2018-2022)
  • CERN
  • Schweizerischer Nationalfonds zur Förderung der Wissenschaftlichen Forschung (177165, 162525, 200021_162525/1, 200021)
Topics
  • Physical Sciences › Engineering › Biomedical Engineering › Photocathodes and Microchannel Plates
  • Physical Sciences › Materials Science › Surfaces, Coatings and Films › Electron and X-Ray Spectroscopy Techniques
  • Physical Sciences › Physics and Astronomy › Atomic and Molecular Physics, and Optics › Atomic and Molecular Physics
Keywords
secondary electron emission, low-energy electron emission, amorphous silicon, alumina, microchannel plates, elastic electron scattering, incident angle dependence, surface roughness, surface composition, emission yield, detector simulation

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