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Intrinsic phonon relaxation times from first-principles studies of the thermal conductivities of Si and Ge

Ward, A., Broido, D. A.·2010·Physical Review B

Abstract

Using a first-principles approach, we present forms for the intrinsic phonon relaxation times in semiconductors, which properly reflect the physically distinct behaviors of the normal and umklapp scattering processes. We find that accurate representation of the phonon-phonon scattering strength and inclusion of scattering of acoustic phonons by optic phonons are essential ingredients, which are missing from the decades old derivations of commonly used intrinsic relaxation times. We also assess the validity of the relaxation time approximation itself for silicon and germanium.

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Metadata

Authors
Ward, A., & Broido, D. A.
Venue
Physical Review B
Published
2010-02-04
Volume
81
Issue
8
ISSN
  • 1098-0121 (ISSN-L)
  • 1550-235X
OpenAlex
W2032689948
Cited by
374
References
2
FWCI
11.89
Type
journal article
Language
en
Open access
closed

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CoChat. (2026). Citation check: Intrinsic phonon relaxation times from first-principles studies of the thermal conductivities of Si and Ge. https://app.cochat.ai/papers/10.1103/physrevb.81.085205
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Ward, A., & Broido, D. A. (2010). Intrinsic phonon relaxation times from first-principles studies of the thermal conductivities of Si and Ge. Physical Review B. https://doi.org/10.1103/physrevb.81.085205

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