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Disorder and the Optical-Absorption Edge of Hydrogenated Amorphous Silicon

Cody, G. D., Tiedje, T., Abeles, B., Brooks, B., Goldstein, Y.·1981·Physical Review Letters

Abstract

The effect of thermal and structural disorder on the electronic structure of hydrogenated amorphous silicon is investigated by measurement of the shape of the optical absorption edge as a function of temperature and thermal evolution of hydrogen. The data are consistent with the idea that the thermal and structural disorder are additive, and suggest that the disorder, rather than the hydrogen content, is the fundamental determining factor in the optical band gap.

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Metadata

Authors
Cody, G. D., Tiedje, T., Abeles, B., Brooks, B., & Goldstein, Y.
Venue
Physical Review Letters
Published
1981-11-16
Volume
47
Issue
20
Pages
1480-1483
ISSN
0031-9007 (ISSN-L)
OpenAlex
W1985133623
Cited by
1,229
References
0
FWCI
40.31
Type
journal article
Language
en
Open access
closed

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CoChat. (2026). Citation check: Disorder and the Optical-Absorption Edge of Hydrogenated Amorphous Silicon. https://app.cochat.ai/papers/10.1103/physrevlett.47.1480
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Cody, G. D., Tiedje, T., Abeles, B., Brooks, B., & Goldstein, Y. (1981). Disorder and the Optical-Absorption Edge of Hydrogenated Amorphous Silicon. Physical Review Letters. https://doi.org/10.1103/physrevlett.47.1480

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