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Conductance in Restricted-Dimensionality Accumulation Layers

Fowler, A. B., Hartstein, A., Webb, R. A.·1982·Physical Review Letters

Abstract

Conductance has been studied in metal-oxide-silicon field-effect transistor accumulation-layer samples in which it is possible to constrict the channel to small dimensions both perpendicular to the surface and perpendicular to the channel. A temperature-dependent conductance $\ensuremath{\sigma}={\ensuremath{\sigma}}_{0}\mathrm{exp}[\ensuremath{-}{(\frac{{T}_{0}}{T})}^{n}]$ is observed, where $n=\frac{1}{2}$ for small channel widths and $n=\frac{1}{3}$ for larger channel widths. It is believed that this behavior arises from a transition from one-dimensional to two-dimensional variable-range hopping in the sample.

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Metadata

Authors
Fowler, A. B., Hartstein, A., & Webb, R. A.
Venue
Physical Review Letters
Published
1982-01-18
Volume
48
Issue
3
Pages
196-199
ISSN
0031-9007 (ISSN-L)
OpenAlex
W2059239926
Cited by
318
References
0
FWCI
28.75
Type
journal article
Language
en
Open access
closed

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CoChat. (2026). Citation check: Conductance in Restricted-Dimensionality Accumulation Layers. https://app.cochat.ai/papers/10.1103/physrevlett.48.196
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Fowler, A. B., Hartstein, A., & Webb, R. A. (1982). Conductance in Restricted-Dimensionality Accumulation Layers. Physical Review Letters. https://doi.org/10.1103/physrevlett.48.196

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