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Large Magnetoresistance at Room Temperature in Ferromagnetic Thin Film Tunnel Junctions

Moodera, J. S., Kinder, Lisa R., Wong, Terrilyn M., Meservey, R.·1995·Physical Review Letters

Abstract

Ferromagnetic-insulator-ferromagnetic tunneling has been measured in CoFe $/$A${\mathrm{l}}_{2}$${\mathrm{O}}_{3}$ $/$Co or NiFe junctions. At 295, 77, and 4.2 K the fractional change in junction resistance with magnetic field, $\ensuremath{\Delta}R/R$, is 11.8%, 20%, and 24%, respectively. The value at 4.2 K is consistent with Julliere's model based on the spin polarization of the conduction electrons of the magnetic films. $\ensuremath{\Delta}R/R$ changes little with a small voltage bias, whereas it decreases significantly at higher bias $(>0.1\mathrm{V})$, in qualitative agreement with Slonczewski's model. These junctions have potential use as low-power field sensors and memory elements.

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Metadata

Authors
Moodera, J. S., Kinder, L. R., Wong, T. M., & Meservey, R.
Venue
Physical Review Letters
Published
1995-04-17
Volume
74
Issue
16
Pages
3273-3276
ISSN
  • 0031-9007 (ISSN-L)
  • 1079-7114
OpenAlex
W1967393072
Cited by
3,707
References
0
FWCI
41.74
Type
journal article
Language
en
Open access
closed

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CoChat. (2026). Citation check: Large Magnetoresistance at Room Temperature in Ferromagnetic Thin Film Tunnel Junctions. https://app.cochat.ai/papers/10.1103/physrevlett.74.3273
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Moodera, J. S., Kinder, L. R., Wong, T. M., & Meservey, R. (1995). Large Magnetoresistance at Room Temperature in Ferromagnetic Thin Film Tunnel Junctions. Physical Review Letters. https://doi.org/10.1103/physrevlett.74.3273

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