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Scaling Laws of the Ripple Morphology on Cu(110)
Abstract
The evolution of the Cu(110) surface morphology during low temperature (180 K) ion sputtering was studied as a function of the incident ion beam angle $\ensuremath{\theta}$ by means of scanning tunneling microscopy. The morphology was dominated by a ripple structure with the wave vector parallel or perpendicular to the direction of the incident beam. The time evolution of the interface shows that the ripple wavelength increases in time following a scaling law $\ensuremath{\lambda}\ensuremath{\propto}{t}^{z}$, with $z\phantom{\rule{0ex}{0ex}}=\phantom{\rule{0ex}{0ex}}0.26\ifmmode\pm\else\textpm\fi{}0.02$. These results are ascribed to the effect of a Schwoebel barrier on the interlayer diffusion of the recoiling atoms produced during ion sputtering.
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Citations
Cites
Fractal Concepts in Surface Growth
Barabási, A. L., & Stanley, H. E. (1995) · doi:10.1017/cbo9780511599798 · Cited by 3,925
Cited by
Morphology of ion-sputtered surfaces
Makeev, M. A., Cuerno, R., & Barabási, A.-L. (2002) · Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms · doi:10.1016/s0168-583x(02)01436-2 · Cited by 503
Roughness Evolution of Ion Sputtered Rotating InP Surfaces: Pattern Formation and Scaling Laws
Frost, F., Schindler, A., & Bigl, F. (2000) · Physical Review Letters · doi:10.1103/physrevlett.85.4116 · Cited by 323
Metadata
- Authors
- Rusponi, S., Costantini, G., Boragno, C., & Valbusa, U.
- Venue
- Physical Review Letters
- Publisher
- American Physical Society (APS)
- Published
- 1998-11-09
- Volume
- 81
- Issue
- 19
- Pages
- 4184-4187
- ISSN
- 0031-9007 (ISSN-L)
- 1079-7114
- OpenAlex
- W2042413596
- Cited by
- 167
- References
- 1
- FWCI
- 10.88
- Type
- journal article
- Language
- en
- Open access
- closed
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- Rusponi, S., Costantini, G., Boragno, C., & Valbusa, U. (1998). Scaling Laws of the Ripple Morphology on Cu(110). Physical Review Letters. https://doi.org/10.1103/physrevlett.81.4184
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