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Quantum Interferometric Optical Lithography: Exploiting Entanglement to Beat the Diffraction Limit

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Boto, Agedi N., Kok, Pieter, Abrams, Daniel S., Braunstein, Samuel L., Williams, Colin P., Dowling, Jonathan P.·2000·Physical Review Letters
DOI 10.1103/physrevlett.85.2733
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Abstract

Classical optical lithography is diffraction limited to writing features of a size lambda/2 or greater, where lambda is the optical wavelength. Using nonclassical photon-number states, entangled N at a time, we show that it is possible to write features of minimum size lambda/(2N) in an N-photon absorbing substrate. This result allows one to write a factor of N2 more elements on a semiconductor chip. A factor of N = 2 can be achieved easily with entangled photon pairs generated from optical parametric down-conversion. It is shown how to write arbitrary 2D patterns by using this method.

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Show all 4 references

Research works printed but not linked: 19

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Metadata

Authors
Boto, A. N., Kok, P., Abrams, D. S., Braunstein, S. L., Williams, C. P., & Dowling, J. P.
Venue
Physical Review Letters
Publisher
American Physical Society (APS)
Published
2000-09-25
Volume
85
Issue
13
Pages
2733-2736
ISSN
  • 0031-9007 (ISSN-L)
  • 1079-7114
DOI
10.1103/physrevlett.85.2733
OpenAlex
W2152231616
Cited by
1,517
References
4
FWCI
34.57
Type
journal article
Language
en
Open access
green
Licence
link.aps.org/licenses/aps-default-license (vor)

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CoChat. (2026). Citation check: Quantum Interferometric Optical Lithography: Exploiting Entanglement to Beat the Diffraction Limit. https://app.cochat.ai/papers/10.1103/physrevlett.85.2733
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Boto, A. N., Kok, P., Abrams, D. S., Braunstein, S. L., Williams, C. P., & Dowling, J. P. (2000). Quantum Interferometric Optical Lithography: Exploiting Entanglement to Beat the Diffraction Limit. Physical Review Letters. https://doi.org/10.1103/physrevlett.85.2733

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Contains information from the Semantic Scholar Academic Graph Datasets, made available under the ODC Attribution License (ODC-BY 1.0).

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