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Cited by 302

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Flicker noise in CMOS transistors from subthreshold to strong inversion at various temperatures

Jimmin Chang, Abidi, A.A., Viswanathan, C.R.·1994·IEEE Transactions on Electron Devices

Abstract

Flicker noise is the dominant noise source in silicon MOSFET's. Even though considerable amount of work has been done in investigating the noise mechanism, controversy still exists as to the noise origin. In this paper, a systematic study of flicker noise in CMOS transistors from twelve different fabricators is reported under various bias conditions corresponding to the gate voltage changing from subthreshold to strong inversion, and the drain voltage changing from linear to saturation regions of operation. The measurement temperature was varied from room temperature down to 5 K. Experimental results consistently suggest that 1/f noise in n-channel devices is dominated by carrier-density fluctuation while in p-channel devices the noise is mainly due to mobility fluctuation.>

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Metadata

Authors
Chang, J., Abidi, A. A., & Viswanathan, C. R.
Venue
IEEE Transactions on Electron Devices
Published
1994
Volume
41
Issue
11
Pages
1965-1971
ISSN
0018-9383 (ISSN-L)
OpenAlex
W2126159071
Cited by
302
References
0
FWCI
5.86
Type
journal article
Language
en
Open access
closed

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CoChat. (2026). Citation check: Flicker noise in CMOS transistors from subthreshold to strong inversion at various temperatures. https://app.cochat.ai/papers/10.1109/16.333812
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Chang, J., Abidi, A. A., & Viswanathan, C. R. (1994). Flicker noise in CMOS transistors from subthreshold to strong inversion at various temperatures. IEEE Transactions on Electron Devices. https://doi.org/10.1109/16.333812

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