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Gallium nitride based high power heterojunction field effect transistors: process development and present status at UCSB

Keller, S., Yi-Feng Wu, Parish, G., Naiqian Ziang, Xu, J.J., Keller, B.P., DenBaars, S.P., Mishra, U.K.·2001·IEEE Transactions on Electron Devices

Abstract

The development of GaN based devices for microwave power electronics at the University of California, Santa Barbara (UCSB), is reviewed. From 1995 to 2000, the power performance of AlGaN/GaN-on-sapphire heterojunction field effect transistors improved from 1.1 W/mm to 6.6 W/mm, respectively. Compensating the disadvantages of the low thermal conductivity of the sapphire substrate through heat management via flip chip bonding onto AlN substrates, large periphery devices with an output power of 7.6 W were demonstrated. UCSB also fabricated the first GaN based amplifier integrated circuits. Critical issues involved in the growth of high quality AlGaN/GaN heterostructures by metal-organic chemical vapor deposition and the device fabrication are discussed.

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Metadata

Authors
Keller, S., Wu, Y.-F., Parish, G., Ziang, N., Xu, J. J., Keller, B. P., DenBaars, S. P., & Mishra, U. K.
Venue
IEEE Transactions on Electron Devices
Published
2001-03
Volume
48
Issue
3
Pages
552-559
ISSN
0018-9383 (ISSN-L)
OpenAlex
W2163458830
Cited by
200
References
0
FWCI
9.00
Type
journal article
Language
en
Open access
closed

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CoChat. (2026). Citation check: Gallium nitride based high power heterojunction field effect transistors: process development and present status at UCSB. https://app.cochat.ai/papers/10.1109/16.906450
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Keller, S., Wu, Y.-F., Parish, G., Ziang, N., Xu, J. J., Keller, B. P., DenBaars, S. P., & Mishra, U. K. (2001). Gallium nitride based high power heterojunction field effect transistors: process development and present status at UCSB. IEEE Transactions on Electron Devices. https://doi.org/10.1109/16.906450

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